Method for growing manganese dioxide nano wall film on conductive substrate
A conductive substrate, manganese dioxide technology, applied in the direction of nanotechnology, hybrid capacitor electrodes, hybrid/electric double layer capacitor manufacturing, etc., can solve the problems of cumbersome production steps, easy agglomeration growth, weak adhesion, etc. Chemical properties, simple preparation method, strong adhesion effect
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Embodiment 1
[0022] (1) Select size 2.5×2.5 cm 2 1. The FTO conductive glass with a thickness of 2.2 mm is the conductive substrate. After the surface of the conductive substrate is cleaned with absolute ethanol, it is washed with deionized water ultrasonically and dried.
[0023] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.20 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.
[0024] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react for 72 hours at 40 °C in an electric blast constant temperature drying oven. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then...
Embodiment 2
[0027] (1) Select size 2.5×2.5 cm 2 1. A metal titanium sheet with a thickness of 0.1 mm is used as a conductive substrate. After the surface of the conductive substrate is pickled, it is ultrasonically cleaned with deionized water and dried.
[0028] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.15 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50 ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.
[0029] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react in an electric blast constant temperature drying oven at 60 °C for 48 hours. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then completely dry ...
Embodiment 3
[0032] (1) Select size 2.5×2.5 cm 2 1. A metal titanium sheet with a thickness of 0.1 mm is used as a conductive substrate. After the surface of the conductive substrate is pickled, it is ultrasonically cleaned with deionized water and dried.
[0033] (2) Fully dissolve potassium permanganate in deionized water to prepare a potassium permanganate solution with a molar concentration of 0.20 M; under constant stirring, add 4 ml of a hydrochloric acid solution with a molar concentration of 0.01 M drop by drop Add it to 50 ml of potassium permanganate solution, and mix the potassium permanganate solution and hydrochloric acid solution evenly to obtain a reaction solution.
[0034] (3) Immerse the clean conductive substrate obtained in step (1) in the reaction solution prepared in step (2), and react for 72 hours at 60 °C in an electric blast constant temperature drying oven. After the reaction, clean and dry with deionization Ultrasonic vibration washing, and then completely dry ...
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