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Teflon thin film with high light transmitting and dewatering functions and preparation method and application thereof

A polytetrafluoroethylene and thin film technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of uneven film thickness and poor adhesion to the substrate, improve adhesion, prevent Oxidation, the effect of improving dimming durability

Inactive Publication Date: 2017-05-17
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention provides a method for preparing polytetrafluoroethylene film by magnetron sputtering to overcome the shortcomings of chemical vapor deposition and wet chemical methods in terms of uneven film thickness and poor adhesion to the substrate.

Method used

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  • Teflon thin film with high light transmitting and dewatering functions and preparation method and application thereof
  • Teflon thin film with high light transmitting and dewatering functions and preparation method and application thereof
  • Teflon thin film with high light transmitting and dewatering functions and preparation method and application thereof

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preparation example Construction

[0031] The invention provides a method for preparing a polytetrafluoroethylene film and its application on a light-adjusting device. The polytetrafluoroethylene film is sputtered on a substrate by using a radio frequency magnetron sputtering method.

[0032] When sputtering PTFE film on the substrate, the preparation conditions are: background vacuum 1*10 -6 ~2*10 -3 Pa, the volume ratio of argon gas to carbon tetrafluoride is 10:1~100:1, the working pressure is 0.5-2.0Pa, the sputtering power is 10-100W, the substrate temperature is 25°C-300°C, and the sputtering time is 15-60min. In a preferred example, the preparation conditions are as follows: background vacuum 2-6*10 -5 Pa, the volume ratio of argon to carbon tetrafluoride is 10:1, the working pressure is 1-1.5Pa, the sputtering power is 10-60W, the substrate temperature is room temperature, and the sputtering time is 15-60min, preferably 30min. By controlling the sputtering time, the thickness of the film can be contr...

Embodiment 1

[0039] The pre-treatment of the glass substrate is ultrasonic washing for 5-10 minutes in the order of 5% sodium hydroxide aqueous solution-deionized water-absolute ethanol-deionized water respectively. The pretreatment of other substrates is boiling with absolute ethanol for 10-60 minutes.

Embodiment 2

[0041] Weigh 20g of polytetrafluoroethylene powder, put it into a mold, heat press and sinter at 310°C, hold heat and pressure for 12h, and obtain a polytetrafluoroethylene target material with a thickness of 3-5mm. Or cut 2-inch targets from Teflon sheets for magnetron sputtering.

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Abstract

The invention relates to a teflon thin film with the high light transmitting and dewatering functions and a preparation method and application thereof. According to the preparation method, a radio frequency magnetron sputtering method is adopted for sputtering the teflon thin film on a substrate. The method includes the preparation conditions that background vacuum pressure is 1*10<6>-2*10<3>Pa, the volume proportion of argon pumped in to carbon tetrafluoride is 10:1-100:1, and working air pressure is 0.5-2.0Pa; and sputtering power is 10-100W, the substrate temperature is 25-300 DEG C, and sputtering time is 15-60 minutes. By means of the teflon thin film with the high light transmitting and dewatering functions and the preparation method and application thereof, the radio frequency magnetron sputtering method is adopted for depositing the teflon thin film on the substrate, so that adhesive force to the substrate by the thin film is increased; and moreover, fluorocarbon gas like CF4 is added into Ar flow, and thus the deposition rate and fluorine content of the thin film can be effectively increased. A certain proportion of CF4 gas is mixed into the argon carrier gas pumped in to serve as supplemental gas, and the problems that F ions at the C-F chain breaking part lose due to glow discharging and thin film quality is lowered are solved.

Description

technical field [0001] The invention belongs to the field of functional materials, and relates to a preparation method of a polytetrafluoroethylene film with high visible light transmission and hydrophobic properties. Background technique [0002] The development of polymer-like films can be traced back to the late 1960s, and such films can be used in low-friction coatings, dielectric films, and optical coatings. Among them, fluorocarbon polymers, as important hydrophobic polymer materials, have excellent corrosion resistance, low dielectric properties, self-lubricating properties, low surface energy, and superior chemical stability, non-stickiness, and hydrophobicity. PTFE is a carbon and fluorine-containing polymer material with high mechanical strength, thermal and chemical stability, and excellent insulating properties. Due to its above advantages, PTFE films are widely used in many fields, such as: anti-pollution coatings for building windows, hydrophobic fabrics, etc....

Claims

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Application Information

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IPC IPC(8): C23C14/12C23C14/35
Inventor 包山虎易娜金平实
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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