Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cosmetic composition for protecting and repairing damaged skin, invisible mask and preparation method of invisible mask

A composition and skin technology, applied in the direction of cosmetic preparations, skin care preparations, cosmetics, etc., can solve problems such as imbalanced skin oil secretion, damaged skin that cannot be used, acne, acne, etc., to help isolate pollution and UV damage, repair damaged skin, and promote absorption

Inactive Publication Date: 2017-05-31
广州睿森生物科技有限公司
View PDF3 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, physical sunscreens tend to clog pores during use, resulting in unbalanced skin oil secretion, and eventually acne, acne, etc., while chemical sunscreens are mainly chemical reagents that will also burden the skin. Strict control, let alone damaged skin
Moreover, the existing isolation and protection products have relatively single functions, and the functions limited to isolation and protection do not have a good repair effect.
Existing repair products also tend to repair the skin without trauma, and do not have the effect of isolation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cosmetic composition for protecting and repairing damaged skin, invisible mask and preparation method of invisible mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The preparation process of the invisible mask for damaged skin protection and repair of the present embodiment is as follows:

[0036] (1) Dissolve 8 g of polyurethane-35, 0.1 g of sodium hyaluronate, 5 g of glycerin, and 0.5 g of urea in 81.7 g of deionized water, slowly heat to 85°C, keep warm for 30 min, and stir until completely dissolved to obtain a mixed solution 1.

[0037] (2) Cool the mixed solution 1 to 45° C., add 0.5 g of collagen, and stir until completely dissolved to obtain the mixed solution 2.

[0038] (3) Add 0.5g of yeast extract, 0.2g of hydrolyzed placenta extract, 0.5g of hydroxyethylurea, 1.5g of olive leaf extract, 0.5g of jujube extract, 1g of cauliflower seedling extract and 100μg of stem cells to the mixture 2 The growth peptide was stirred evenly to obtain the mixture 3.

[0039] (4) After the mixed solution 3 is filtered through 200 mesh, it is poured into a facial mold, and freeze-dried at -10°C for 12 hours to obtain the product.

Embodiment 2

[0041] The preparation process of the invisible mask for damaged skin protection and repair of the present embodiment is as follows:

[0042] (1) Dissolve 5 g of polyurethane-35, 0.1 g of sodium hyaluronate, 5 g of glycerin, and 0.5 g of urea in 81.7 g of deionized water, slowly heat to 85°C, keep warm for 30 min, and stir until completely dissolved to obtain a mixed solution 1.

[0043] (2) Cool the mixed solution 1 to 45° C., add 0.5 g of collagen, and stir until completely dissolved to obtain the mixed solution 2.

[0044] (3) Add 0.5g of yeast extract, 0.5g of hydroxyethylurea, 0.5g of olive leaf extract, 0.5g of blueberry leaf extract, 3g of cauliflower seedling extract and 50 μg of stem cell growth peptide to the mixture 2, and stir evenly. Mixture 3 was obtained.

[0045] (4) After the mixed solution 3 is filtered through 200 mesh, it is poured into a facial mold, and freeze-dried at -10°C for 12 hours to obtain the product.

Embodiment 3

[0047] The preparation process of the invisible mask for damaged skin protection and repair of the present embodiment is as follows:

[0048] (1) Dissolve 12g of polyurethane-35, 0.1g of sodium hyaluronate, and 5g of glycerin in 81.7g of deionized water, slowly heat to 85°C, keep warm for 30min, and stir until completely dissolved to obtain a mixed solution 1.

[0049] (2) Cool the mixed solution 1 to 45° C., add 0.5 g of collagen, and stir until completely dissolved to obtain the mixed solution 2.

[0050] (3) Add 0.5g yeast extract, 0.2g hydrolyzed placenta extract, 0.5g hydroxyethyl urea, 0.5g olive leaf extract, 1g aloe extract, 0.5g cauliflower seedling extract and 150μg stem cells to the mixture 2 The growth peptide was stirred evenly to obtain the mixture 3.

[0051] (4) After the mixed solution 3 is filtered through 200 mesh, it is poured into a facial mold, and freeze-dried at -10°C for 12 hours to obtain the product.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a cosmetic composition for protecting and repairing damaged skin, an invisible mask and a preparation method of the invisible mask. The cosmetic composition for protecting and repairing the damaged skin comprises the following components: stem cell growth peptide, an olive leaf extract and a broccolini extract, wherein the weight ratio of the stem cell growth peptide to the olive leaf extract to the broccolini extract is (5*10<5>-15*10<5>):(0.5-3):(0.5-3). According to the invisible mask prepared from the cosmetic composition for protecting and repairing the damaged skin, epidermic or hypodermal cells can be synergistically prompted for proliferation and migration, metabolism of the skin is accelerated, wound healing is prompted and the damaged skin can be quickly repaired. According to the prepared invisible mask, the preparation method of the invisible mask for isolation and protection is simple and suitable for large-scale production; the mask prepared by adopting a freeze drying method does not affect an active ingredient, and zero burden of the skin can be really achieved.

Description

technical field [0001] The invention relates to the field of skin care products or cosmetics, in particular to a cosmetic composition for protecting and repairing damaged skin, an invisible mask and a preparation method thereof. Background technique [0002] The skin is the largest organ of the human body, and it is also the most vulnerable tissue, such as burns, scalds, and skin injuries caused by cosmetic surgery. The damaged skin is very fragile and prone to infection at any time, so the protection of this type of skin is particularly important. Air pollution and UV damage can add to the damage on damaged skin. [0003] At present, there are few products on the market for isolation and protection of damaged skin. Existing isolation and protection products mainly use physical sunscreens or chemical sunscreens. The commonly used physical sunscreens mainly include titanium dioxide and zinc oxide, and the commonly used chemical sunscreens are mainly octyl methoxycinnamate a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/9794A61K8/9728A61K8/98A61K8/64A61K8/65A61K8/73A61K8/87A61Q17/04A61Q19/00
CPCA61Q17/04A61Q19/00A61Q19/004A61K8/64A61K8/65A61K8/73A61K8/87A61K8/97A61K8/982A61K8/99A61K2800/85
Inventor 魏坤王晓慧孙金媛胡露谢水林
Owner 广州睿森生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com