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Method for preparing single-layer diamond abrasive tool through chemical vapor deposition

A chemical vapor deposition, single-layer diamond technology, used in manufacturing tools, grinding devices, metal processing equipment, etc., can solve the problem of brazing residual stress, the uneven thickness of the binder layer of the solder layer, the inability to prepare diamond abrasives, thermal expansion Coefficient of large difference and other problems, to achieve the effect of improving antioxidant capacity, reducing scratches, and high grain fullness value

Active Publication Date: 2017-07-07
SHANGHAI JIAO TONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] After searching the existing technology, it was found that the Chinese invention patent application "A preparation method for fine-grained diamond abrasive single-layer brazing tools" (CN 102513632 A) proposed a preparation method for fine-grained diamond abrasive tools. A diamond abrasive tool with uniform abrasive grain height and strong holding force can be produced, but the abrasive grain size used in this method is about 20-100 μm, and it is impossible to prepare a diamond abrasive tool with a lower particle size, and the preparation process includes two brazing steps, which is complicated and costly High, and high temperature brazing will cause diamond graphitization
The Chinese invention patent application "A method of manufacturing a brazed single-layer diamond grinding wheel" (CN 103786100 A) proposes a method for preparing a boron-doped diamond grinding wheel, and the boron-doped diamond grinding wheel prepared by this method improves the thermal stability of the diamond However, it is still unavoidable to avoid the disadvantages of large difference in thermal expansion coefficient between the bond and diamond abrasive grains, large brazing residual stress, and uneven thickness of the bond layer in the solder layer.

Method used

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  • Method for preparing single-layer diamond abrasive tool through chemical vapor deposition
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  • Method for preparing single-layer diamond abrasive tool through chemical vapor deposition

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preparation example Construction

[0040] Specifically, the preparation method of the single-layer CVD diamond grinding tool that the present invention relates to comprises the steps:

[0041] In the first step, the diamond micropowder obtained by mechanically crushing large-grained high-temperature and high-pressure diamond abrasives is used as an abrasive (also called abrasive grains), and the particle size of the diamond micropowder is 5-100 μm. Ultrasonic vibration is used to make it fully mixed, and then the photoresist solution mixed with diamond micropowder is evenly spread on the surface of the substrate by using the glue-spinning technology.

[0042] In the second step, a diamond coating is deposited on the surface of the silicon carbide substrate treated in the first step by hot wire chemical vapor deposition. The coating will be used as a bond diamond abrasive to connect with the substrate, and during the coating deposition process, The diamond abrasive will also grow homoepitaxially, so that the abr...

Embodiment 1

[0044] The substrate is silicon carbide, and the dimensions are 13mm×17mm×9mm.

[0045] The preparation method of a single-layer CVD diamond abrasive tool with a particle size of M4 / 8 is as follows: the diamond abrasive with a particle size of M4 / 8 prepared by a mechanical crushing method is mixed into a photoresist solution, and the concentration of the abrasive is 20mg / ml. Then the mixed solution was stirred rapidly, and it was subjected to 30min ultrasonic vibration treatment to eliminate the clusters of the diamond abrasive, so that the abrasive was evenly dispersed in the photoresist, and then the photoresist abrasive mixed solution was evenly dispersed on the substrate surface. Among them, the glue-spinning speed is 4000rpm, and the duration is 30s.

[0046] Finally, a layer of diamond coating is deposited on the surface of the substrate distributed with photoresist and diamond micropowder by hot wire chemical vapor deposition. The hot wire adopts a twisted-pair tantal...

Embodiment 2

[0050] The substrate is silicon carbide, and the dimensions are 13mm×17mm×9mm.

[0051] The preparation method of a single-layer CVD diamond abrasive tool with a particle size of M8 / 16 is as follows: the diamond abrasive with a particle size of M8 / 16 prepared by mechanical crushing is mixed into the photoresist solution, and the concentration of the abrasive is 60mg / ml. Then the mixed solution was stirred rapidly, and subjected to ultrasonic vibration treatment for 30 minutes, so that the abrasive was evenly dispersed in the photoresist, and then the mixed solution of photoresist abrasive particles was evenly spread on the surface of the substrate by using the glue-spinning technique. Among them, the glue-spinning speed is 4000rpm, and the duration is 40s.

[0052] Finally, a layer of diamond coating is deposited on the surface of the substrate distributed with photoresist and diamond micropowder by hot wire chemical vapor deposition. The hot wire adopts a twisted-pair tantal...

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Abstract

The invention discloses a method for preparing a single-layer diamond abrasive tool through chemical vapor deposition. According to a silicon carbide base body, a diamond abrasive material is mixed into a photoresist solution and is subject to ultrasonic vibration, rotating whirl coating is used for evenly dispersing diamond abrasive particles, uniform distribution of the particles on a base body substrate can be achieved, the CVD method is adopted to enable the diamond coating bonding agent to be subject to deposition between the diamond abrasive particles and the silicon carbide base body, the abrasive material and the base body are firmly connected together, and meanwhile, the abrasive particles grow to become high-grade cubic octahedral single-crystal particles. The prepared single-layer diamond abrasive tool is high in abrasive particle holding force, the exposure height is large, the chipping containing space is large, defects of electroplating and brazing single-layer diamond abrasive tools are overcome, and the method is suitable for preparing fine granularity (five micrometers to 100 micrometers) single-layer diamond abrasive tools. The prepared single-layer diamond abrasive tool has the wide application prospect in high-precise grinding fields of crisp and hard materials of semiconductors, optical crystals, artificial sapphire, glass and the like

Description

technical field [0001] The invention relates to the technical field of preparation of diamond abrasive tools, in particular to a method for preparing single-layer diamond grinding tools by chemical vapor deposition (Chemical Vapor Deposition, CVD for short). Background technique [0002] At present, single-layer diamond abrasive tools include single-layer electroplated diamond tools and single-layer brazed diamond tools. Single-layer electroplated diamond abrasive tools lack firm metallurgical chemical bonding because the abrasive is actually mechanically embedded in the coating metal. Therefore, the holding force is not strong, and it is easy to fall off. In order to increase the holding force of the abrasive grains, the thickness of the coating is increased, the exposed height of the abrasive grains is low, the sharpness of the abrasive tool is poor, and the chip space is small, which is prone to clogging. The single-layer brazed diamond abrasive tools that appeared in the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24D18/00
CPCB24D18/0072
Inventor 孙方宏申笑天王新昶郭松寿张文骅郭睿
Owner SHANGHAI JIAO TONG UNIV
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