Zinc oxide/tin dioxide photoelectrode with diamond structure and its preparation method and application
A diamond-shaped structure and tin dioxide technology, which is applied in chemical instruments and methods, separation methods, light water/sewage treatment, etc., can solve the problems of cleanliness, energy saving, efficient preparation of photocatalytic films, unfavorable photocatalytic degradation of film structures, The degree of substrate bonding is not firm, etc., to achieve the effect of less defects, orderly arrangement of bonding height, and strong bonding force
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Embodiment 1
[0037] 1) Configuration of ZnO precursor solution:
[0038] Add NH to deionized water 4 F, then add Zn(NO 3 ) 2 ·6H 2 O, stirred at room temperature for 10 min until clear, then added NaOH solution, adjusted the pH to 6.0, and stirred for 10 min until clear to obtain a ZnO precursor; 4 F and Zn(NO 3 ) 2 ·6H 2 The molar ratio of O is 5:1; the concentration of Zn element in the ZnO precursor solution is 0.040mol / L;
[0039] 2) Functionalization of the substrate:
[0040] SnO 2 / The glass substrate was placed in water, acetone, and absolute ethanol for 10 minutes of ultrasonic cleaning. The washed SnO 2 / The glass substrate is irradiated with 184.9nm ultraviolet light for 30min to make SnO 2 / The surface of the glass substrate forms a hydroxyl monolayer, that is, the glass / SnO 2 -OH - hydroxyl layer;
[0041] 3) Self-assembly of thin films:
[0042] Glass / SnO 2 -OH - The hydroxyl layer was suspended on the surface of the ZnO precursor solution at 70°C for self-...
Embodiment 2
[0048] 1) Configuration of ZnO precursor solution:
[0049] Add NH to deionized water 4 F, then add Zn(NO 3 ) 2 ·6H 2 O, stirred at room temperature for 15min until clear, then added NaOH solution, adjusted the pH to 5.0, and stirred for 15min until clear to obtain a ZnO precursor; 4 F and Zn(NO 3 ) 2 ·6H 2 The molar ratio of O is 6:1; the concentration of Zn element in the ZnO precursor solution is 0.050mol / L;
[0050] 2) Functionalization of the substrate:
[0051] SnO 2 / The glass substrate was placed in water, acetone, and absolute ethanol for 10 minutes of ultrasonic cleaning. The washed SnO 2 / The glass substrate is irradiated with 184.9nm ultraviolet light for 20min to make the SnO 2 / The surface of the glass substrate forms a hydroxyl monolayer, that is, the glass / SnO 2 -OH - hydroxyl layer;
[0052] 3) Self-assembly of thin films:
[0053] Glass / SnO 2 -OH - The hydroxyl layer was suspended on the surface of the ZnO precursor solution at 55°C for sel...
Embodiment 3
[0059] 1) Configuration of ZnO precursor solution:
[0060] Add NH to deionized water 4 F, then add Zn(NO 3 ) 2 ·6H 2 O, stirred at room temperature for 20min until clear, then added NaOH solution, adjusted the pH to 7.0, and stirred for 20min until clear to obtain a ZnO precursor; 4 F and Zn(NO 3 ) 2 ·6H 2 The molar ratio of O is 7:1; the concentration of Zn element in the ZnO precursor solution is 0.060mol / L;
[0061] 2) Functionalization of the substrate:
[0062] SnO 2 / The glass substrate was placed in water, acetone, and absolute ethanol for 10 minutes of ultrasonic cleaning. The washed SnO 2 / The glass substrate is irradiated with 184.9nm ultraviolet light for 40min to make SnO 2 / The surface of the glass substrate forms a hydroxyl monolayer, that is, the glass / SnO 2 -OH - hydroxyl layer;
[0063] 3) Self-assembly of thin films:
[0064] Glass / SnO 2 -OH - The hydroxyl layer was suspended on the surface of the ZnO precursor solution at 85°C for self-ass...
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