Ultrathin film and preparation method of organic field-effect transistor sensor based on ultrathin film
A technology of ultra-thin film and material thin film, which is applied in the direction of instruments, scientific instruments, measuring devices, etc., to achieve the effect of high sensitivity, low price and good repeatability
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Embodiment 1
[0030] The present embodiment prepares P3HT ultra-thin film and organic field-effect transistor sensor based on it as follows:
[0031] (1) Dissolve P3HT in chlorobenzene to form a solution A with a concentration of 10 mg / mL, and dissolve PMMA in chlorobenzene to form a solution B with a concentration of 100 mg / mL; mix solution A and solution B evenly to form a blend Solution, in the blend solution, the mass ratio of P3HT and PMMA is 1:80.
[0032] (2) Wash the n-type silicon wafer with a concentrated sulfuric acid-hydrogen peroxide mixed solution and use it as a substrate; spin-coat the blended solution on the substrate at a speed of 2000 rpm and vacuum dry it at room temperature for 12 hours by spin coating Form a double-layer film with PMMA film as the bottom layer and P3HT film as the top layer;
[0033] (3) Take a silicon wafer with silicon dioxide on the surface (and the surface silicon dioxide layer is modified by octadecylsilane (ODTs)) as a substrate, and float the d...
Embodiment 2
[0040] In this example, P3HT ultra-thin films were prepared in the same manner as in Example 1, except that the mass ratios of P3HT and PMMA in step (1) were sequentially modified to 1:10, 1:20 and 1:40. Figure 6 Shown are the atomic force microscope images of the obtained P3HT ultra-thin films under the corresponding conditions, and it can be seen that the thicknesses of the obtained P3HT ultra-thin films are 7.4nm, 5.2nm and 2.8nm respectively.
[0041] In this example, a P3HT ultra-thin film organic field-effect transistor sensor was prepared by the same method as in Example 1, and its ammonia sensing performance was tested. The results show that the sensitivities of the ultra-thin film organic field-effect transistor sensors prepared under the mass ratio conditions of 1:10, 1:20 and 1:40 are 6.88%, 8.72% and 18.62%, respectively, and the response times are 9.23s and 8.67s, respectively. and 9.62s, the recovery time is 122.79s, 101.33s and 95.57s respectively.
Embodiment 3
[0043] The present embodiment prepares PIIDBT ultra-thin film and organic field-effect transistor sensor based on it as follows:
[0044] (1) PIIDBT is dissolved in chloroform to form concentration and is the solution A of 1mg / mL, and PMMA is dissolved in chloroform and forms the solution B that concentration is 10mg / mL; Solution A and solution B are mixed uniformly, constitute blending solution, in In the blend solution, the mass ratio of PIIDBT and PMMA was 1:60.
[0045] (2) Wash the n-type silicon wafer with a concentrated sulfuric acid-hydrogen peroxide mixed solution and use it as a substrate; spin-coat the blended solution on the substrate at a speed of 2000 rpm and vacuum dry it at room temperature for 12 hours by spin coating Form a double-layer film with PMMA film as the bottom layer and PIIDBT film as the top layer;
[0046] (3) Take a silicon wafer with silicon dioxide on the surface (and the surface silicon dioxide layer is modified by octadecylsilane (ODTs)) as ...
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