GaN hetero-junction longitudinal inverse-conduction field effect tube

A technology of heterojunction and reverse conduction field, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of increasing parasitic capacitance and parasitic inductance, low hole mobility of P-type GaN, increasing system volume and cost, etc. Achieve low turn-on voltage, short reverse recovery time, improve efficiency and stability

Active Publication Date: 2017-12-15
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, discrete freewheeling diodes not only increase the size and cost of the system, but also increase the parasitic capacitance and parasitic inductance, resulting in increased switching losses
Traditional GaN PN junction diodes are not suitable for use as freewheeling diodes due to their high turn-on voltage and low hole mobility of P-type GaN.

Method used

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  • GaN hetero-junction longitudinal inverse-conduction field effect tube
  • GaN hetero-junction longitudinal inverse-conduction field effect tube
  • GaN hetero-junction longitudinal inverse-conduction field effect tube

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Embodiment Construction

[0025] Below in conjunction with accompanying drawing, describe technical scheme of the present invention in detail:

[0026] The present invention proposes a high-performance GaN heterojunction reverse conduction field effect transistor. Different from the traditional transverse field effect transistor, the present invention adopts a vertical discrete gate structure and deposits a Schottky source between the two gates. The present invention reduces the concentration of two-dimensional electron gas (2DEG) in the channel by forming a "double potential barrier" between the P-type gate and the P-type base region, so that the device has a higher threshold voltage. Because the device adopts a vertical structure, the electric field distribution is much more uniform than that of the traditional horizontal device, which can save the wafer area while achieving high withstand voltage and low on-resistance. In the reverse conduction working state, the turn-on voltage of the Schottky diod...

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Abstract

The invention relates to the technical field of semiconductor devices, and relates to a GaN hetero-junction inverse-conduction field effect tube. According to the invention, a longitudinal discrete gate structure is adopted; a schottky source electrode is deposited between the gate electrodes so as to form an anode of an inverse-conduction diode; and through the joint action of the back barrier formed in the p-type base region and the p-type gate, the two-dimensional electron gas (2 DEG) below the gate can be depleted; and through the adjustment of the re-growth thickness of the ALMN barrier layer, the threshold voltage can be accurately regulated and controlled. The effect tube has the beneficial effects that under the working state of a forward switch, the threshold voltage is adjustable, that the on-resistance is low, that the saturation current is large, that the off-state withstanding voltage is high, and that working frequency is high and power consumption is low and the like; and under the inverse-conduction working state, the starting voltage is low, the on-resistance is low, the inverse withstanding voltage is large, the inverse recovery time is short, and the power consumption is low and the like. Meanwhile, the manufacturing process is compatible with a traditional GaN hetero-junction HEMT device and is particularly suitable for a GaN hetero-junction longitudinal power field effect tube.

Description

technical field [0001] The invention relates to the technical field of semiconductor devices, and relates to a GaN heterojunction power field effect transistor. Background technique [0002] As a typical representative of the third-generation wide-bandgap semiconductor, gallium nitride (GaN) has many excellent characteristics: high critical breakdown electric field (~3.5×10 6 V / cm), high electron mobility (~2000cm 2 / vs), high two-dimensional electron gas (2DEG) concentration (~10 13 cm -2 ) and good high temperature working ability, etc. High electron mobility transistor (HEMT) based on AlGaN / GaN heterojunction (or heterojunction field effect transistor HFET, modulation doped field effect transistor MODFET, hereinafter collectively referred to as HEMT devices) has been used in wireless communication, satellite communication and other radio frequency / Microwave field. In addition, such devices based on wide-bandgap GaN materials have the characteristics of high off-stat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/778H01L29/20H01L29/06
CPCH01L29/0611H01L29/2003H01L29/7788
Inventor 周琦朱若璞陈万军张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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