Hydrogenated titanium dioxide nanorod array/silicon heterojunction broadband optical detector and preparation method thereof
A technology of hydrogenated titanium dioxide and nanorod arrays, which is applied in nanotechnology, nanotechnology, nanotechnology and other directions for materials and surface science, can solve problems such as short response recovery time, achieve easy integration, important application value, suitable for The effect of mass production
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[0026] We selected an n-type monocrystalline silicon wafer with a thickness of 0.5 mm as the substrate, and retained its natural oxide layer. Clean the silicon wafer in ultrasonic wave with deionized water for 15 minutes, then clean the silicon wafer in ultrasonic wave with acetone for 20 minutes, and finally clean the silicon wafer with absolute ethanol for 20 minutes. After drying, repeat the above cleaning process again.
[0027] Dry the cleaned n-type silicon substrate and place it in a spin-coating chamber. Spin-coat the titanium dioxide seed layer under the background of continuously flowing nitrogen gas. Put the titanium dioxide film / silicon prepared by the spin coating method into a tubular resistance furnace for annealing in a nitrogen atmosphere at a temperature of 800 degrees Celsius, with a heating rate of 4 degrees Celsius per minute, and keep at 800 degrees Celsius for 2 hours to obtain a titanium dioxide porous film / silicon. Put the titanium dioxide porous fi...
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