Silicon dioxide hollow microsphere, preparation method thereof, application thereof to thermal insulating coating

A technology of silicon dioxide and thermal insulation coating, applied in the directions of silicon dioxide, silicon oxide, coating, etc., can solve the problem that the inner diameter of hollow microspheres cannot be effectively controlled, the particle morphology and size are not uniform, and the yield of hollow microspheres can not be effectively controlled. Low problems, to achieve good heat insulation effect, long drying cycle, small density effect

Active Publication Date: 2018-04-24
广东吉美帮新材料有限公司
View PDF7 Cites 32 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this application is based on the nano-precipitation of water-soluble anionic sodium polyacrylate or sodium polymethacrylate in alcohol as a template. The particle shape and size prepared by this template are not uniform, and cannot be monodispersed, nor can it effectively control the hollow microparticles. The inner diameter of the ball is small, and the anionic polymer template cannot form a good affinity with the silicon source precursor, resulting in a low yield of hollow microspheres

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon dioxide hollow microsphere, preparation method thereof, application thereof to thermal insulating coating
  • Silicon dioxide hollow microsphere, preparation method thereof, application thereof to thermal insulating coating
  • Silicon dioxide hollow microsphere, preparation method thereof, application thereof to thermal insulating coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] 1) Preparation of polystyrene microspheres:

[0050] Dissolve 20g of styrene and 4g of polyvinylpyrrolidone in 180ml of deionized water, stir at 350rpm for 15min, and heat up to 70°C to obtain a mixed solution; weigh 0.4g of azobisisobutylamidine hydrochloride with 20g of deionized Dissolve in water to obtain an initiator solution; add the initiator solution to the above mixed solution and react for 7 hours to obtain polystyrene microspheres

[0051] 2) Preparation of polystyrene / silica composite microspheres:

[0052] Take 12g of polystyrene as a template and 190g of absolute ethanol as a solvent in a four-neck flask and mix evenly, add 6ml of ammonia water with a mass fraction of 28% and stir at 200rpm for 15min, then slowly add 20ml of orthosilicic acid with a mass fraction of 25% Ethyl ester / ethanol solution, control the reaction temperature at 30°C, and react for 24 hours to obtain polystyrene / silica composite microspheres

[0053] 3) Preparation of silica hollow...

Embodiment 2

[0061] 1) Preparation of polystyrene microspheres:

[0062] Dissolve 20g of styrene and 2g of polyvinylpyrrolidone in 180ml of deionized water, stir at 400rpm for 15min, and heat up to 70°C;

[0063] The potassium persulfate of 0.2g is dissolved with 20g deionized water to obtain initiator solution;

[0064] The initiator solution was added to the above mixed solution to react for 7h;

[0065] 2) Preparation of polystyrene / silica composite microspheres:

[0066] Take 12g of polystyrene as a template and 190g of absolute ethanol as a solvent in a four-neck flask and mix evenly, add 3ml of ammonia water with a mass fraction of 26%, stir at 250rpm for 15min, then slowly add 20ml of 50% tetraethyl orthosilicate / ethanol solution, control the reaction temperature at 30°C, and react for 20 hours;

[0067] 3) Preparation of silica hollow microspheres:

[0068] The mixed solution obtained from the above reaction was centrifuged at 8500 rpm for 15 minutes, washed and dried, and the ...

Embodiment 3

[0073] 1) Preparation of polystyrene microspheres:

[0074] Dissolve 15g of styrene and 4g of polyvinylpyrrolidone in 190ml of deionized water, stir at 400rpm for 15min, and heat up to 75°C;

[0075] The ammonium persulfate that takes 0.3g is dissolved with 10g deionized water, obtains initiator solution;

[0076] The initiator solution was added to the above mixed solution to react for 8h;

[0077] 2) Preparation of polystyrene / silica composite microspheres:

[0078] Take 10g polystyrene as a template and 190g absolute ethanol as a solvent in a four-necked flask and mix evenly, add 1.5ml of ammonia water with a mass fraction of 28%, stir at 200rpm for 15min, then slowly add 20ml of 20% tetraethyl orthosilicate / Ethanol solution, control the reaction temperature at 35°C, and react for 24 hours;

[0079] 3) Preparation of silica hollow microspheres:

[0080] The mixed solution obtained from the above reaction was centrifuged at 8500 rpm for 20 minutes, washed and dried, and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a silicon dioxide hollow microsphere, a preparation method thereof, application thereof to thermal insulating coating. The silicon dioxide hollow microsphere is prepared by taking polystyrene as the template and absolute ethyl alcohol as solvent, adding in tetraethoxysilane, hydrolyzing the mixture in alkaline conditions, controlling the reaction temperature at 28-32 DEG Cfor reaction for 22-26 h, performing centrifugal treatment, washing and drying to obtain solid powder and sintering the obtained solid powder at 540-560 DEG C for 7-8 h. The obtained silicon dioxide hollow microsphere is stable in structure, uniform in size and controllable in grain size; the thermal insulating coating obtained through the silicon dioxide hollow microsphere is good in film-formingproperty, easy to construct and good in thermal insulating effects and has a broad application prospect in development of the thermal insulating coating industry.

Description

technical field [0001] The invention relates to a heat-insulating coating, in particular to a silica hollow microsphere, a preparation method thereof and an application in a heat-insulating coating. Background technique [0002] China has the largest population in the world, so it has a large number of existing buildings and various buildings under construction. By the end of 2020, the national housing area is expected to reach 7 billion m 2 Around this time, building energy consumption will rapidly increase to more than 30% of the country's total energy consumption. In recent years, people have gradually realized that thermal insulation coatings have a special effect on solving problems caused by solar radiation. Thermal insulation coatings use mechanisms such as blocking, reflecting and radiating heat to reduce the final heat of the building by reducing the surface temperature of the coated object, reducing the heat absorption of the coated substrate, and increasing the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/18C09D7/61C09D133/04
CPCC01B33/18C01P2004/04C01P2004/62C09D133/04C08L1/286C08L71/02C08K7/26
Inventor 张心亚胡佩艾丹
Owner 广东吉美帮新材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap