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Bio-based film-forming resin and photoresist prepared by same

A film-forming resin and bio-based technology, applied in the field of functional polymer materials, can solve the problems of affecting the edge roughness of the resin and reducing the free volume of the polymer chain, so as to achieve good product application performance, improve solubility, polymer molecular weight and The effect of strong distribution controllability

Active Publication Date: 2018-05-29
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After the traditional 248nm photoresist resin is exposed, the acid diffusion problem of the rubber sample is serious, which affects the edge roughness of the resin. The addition of cholic acid groups will increase the density of carbon and reduce the free volume of the polymer chain, thereby improving acid diffusion. question

Method used

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  • Bio-based film-forming resin and photoresist prepared by same
  • Bio-based film-forming resin and photoresist prepared by same
  • Bio-based film-forming resin and photoresist prepared by same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] A bio-based film-forming resin is prepared through the following steps:

[0038] (1) Take a clean three-neck bottle, install the reflux and condensation device, add 1.68g of acetoxystyrene (ASM), 1.9g of tert-butyl methacrylate cholate (MATBCE), 0.14g of AIBN and 15g of THF, and pass N 2 Protection for 5 minutes;

[0039] (2) Put the three-neck flask in an oil bath at 65°C for 20 hours to obtain the intermediate product PASMATB-1;

[0040] (3) Subsequently, 10 g of THF was distilled off, 0.9 g of sodium methoxide and 20 ml of methanol were added, the temperature was raised to 75° C., alcoholysis was carried out for 6 hours, and the reaction was completed to obtain the final product PHSMATB-1;

[0041] (4) Using methanol as a solvent and water as a precipitant, the resulting product was repeatedly dissolved, purified with water three times, and the precipitate was dried in a vacuum oven at 60° C. to obtain a white solid, namely the bio-based film-forming resin. Accordi...

Embodiment 2

[0043] A bio-based film-forming resin is prepared through the following steps:

[0044] (1) Take a clean three-necked bottle, install the reflux and condensation device, add 1.12g of acetoxystyrene (ASM), 3.8g of tert-butyl methacrylate cholate (MATBCE), 0.14g of AIBN and 15g of THF, and pass N 2 Protection for 5 minutes;

[0045] (2) Put the three-necked flask in a 65°C oil bath for 20 hours to obtain the intermediate product PASMATB-2;

[0046] (3) Then 10 g of THF was distilled off, 0.6 g of sodium methoxide and 20 ml of methanol were added, the temperature was raised to 75 ° C, alcoholysis was carried out for 6 h, and the reaction was completed to obtain the final product PHSMATB-2;

[0047] (4) Using methanol as a solvent and water as a precipitant, the resulting product was repeatedly dissolved, purified with water three times, and the precipitate was dried in a vacuum oven at 60° C. to obtain a white solid, namely the bio-based film-forming resin. According to the GPC...

Embodiment 3

[0052] A bio-based film-forming resin is prepared through the following steps:

[0053] (1) Take a clean three-necked bottle, install the reflux and condensation device, add 0.56g of acetoxystyrene (ASM), 5.7g of tert-butyl methacrylate cholate (MATBCE), 0.14g of AIBN and 15g of THF, and pass N 2 Protection for 5 minutes;

[0054] (2) Place the three-neck flask in an oil bath at 65°C for 20 hours to obtain the intermediate product PASMATB-3;

[0055] (3) Subsequently, 10 g of THF was distilled off, 0.3 g of sodium methoxide and 20 ml of methanol were added, the temperature was raised to 75° C., alcoholysis was carried out for 6 h, and the reaction was completed to obtain the final product PHSMATB-3;

[0056] (4) Using methanol as a solvent and water as a precipitant, the resulting product was repeatedly dissolved, purified with water three times, and the precipitate was dried in a vacuum oven at 60° C. to obtain a white solid, namely the bio-based film-forming resin. Accordi...

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Abstract

The invention discloses bio-based film-forming resin and photoresist prepared by the same. The bio-based film-forming resin is prepared by styrene derivatives and cholic acid derivatives through freeradical polymerization reaction and alcoholysis reaction. The bio-based film-forming resin is mixed with a photo-acid generator, auxiliaries, a solvent and the like to prepare the 365nm and 248nm photoresist. The bio-based film-forming resin has the advantages that polymerizable monomers containing natural product cholic acid are introduced into conventional poly(p-hydroxystyrene) film-forming resin to form the new improved film-forming resin, the new film-forming resin can increase the ultraviolet transparency of the photoresist and increase the photosensitivity of the photoresist, and the large cyclic structure of the film-forming resin can increase carbon compactness, reduce the free volume of polymerization chains, increase heat resistance and increase the etching resistance of the film-forming resin; large lateral chains can improve the problem of acid diffusion, increase dissolution difference and lower image edge roughness.

Description

technical field [0001] The invention relates to the technical field of functional polymer materials, in particular to a bio-based film-forming resin prepared by using cholic acid derivatives and styrene derivatives as polymerized monomers, and its application in the field of 365nm or 248nm photoresist . Background technique [0002] Photoresists are widely used in microelectronics manufacturing fields such as discrete devices, LEDs, integrated circuits, and TFT-LCDs. They affect major fields such as information engineering, energy and environmental protection, and national defense, and play a very important role in the development of high-tech industries and the national economy. effect. The photoresist is mainly composed of resin, photoacid generator, auxiliary agent and solvent. Through exposure, development, etching, film removal and other processes, the pattern on the mask plate is transferred to the substrate such as silicon wafer. According to the development mechani...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/28C08F212/14G03F7/004
CPCC08F220/28C08F220/283G03F7/004C08F212/14
Inventor 刘敬成纪昌炜刘仁袁妍刘晓亚
Owner JIANGNAN UNIV
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