Snapshot Imaging Spectrometer Based on Micro Imaging Mirror Array and Stepped Phase Mirror

An imaging spectrometer and mirror technology, applied in spectrometry/spectrophotometry/monochromator, instrument, scientific instrument, etc., to achieve fast detection speed, high integration, and strong stability

Active Publication Date: 2019-12-13
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of real-time acquisition of three-dimensional data cube and miniaturization of imaging spectrometer in existing traditional imaging spectrometer, the present invention provides a snapshot imaging spectrometer based on micro imaging mirror array and stepped phase reflector

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Snapshot Imaging Spectrometer Based on Micro Imaging Mirror Array and Stepped Phase Mirror
  • Snapshot Imaging Spectrometer Based on Micro Imaging Mirror Array and Stepped Phase Mirror
  • Snapshot Imaging Spectrometer Based on Micro Imaging Mirror Array and Stepped Phase Mirror

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] Example 1: for Figure 8 The grid beam splitter shown in s is manufactured, and the material is a double-sided polished (100) single crystal silicon wafer with high flatness and high parallelism. Its preparation method is:

[0075] 1. Growth or evaporation of silicon dioxide and silicon nitride and other dielectric films or composite films on the cleaned double-sided polished single crystal silicon surface as a masking film;

[0076] 2. Directional photolithography to expose the side groove pattern, and remove the masking film in the side groove pattern by etching to expose the surface of the single crystal silicon. Use single crystal silicon anisotropic etching solution to etch the side groove, and the etching depth is equal to the final thickness of the beam splitter window; the shape of the side groove can also be formed by arranging multiple rectangles or squares at a certain distance apart from the figure shown in the figure.

[0077] 3. Perform a second photolit...

Embodiment 2

[0079] Embodiment 2: For both horizontal and vertical grid rib structures Figure 9 The double-sided grating beam splitter of f can be manufactured by the above method, the difference is that it is necessary to prepare a double-sided masking film, which is realized by double-sided photolithography and double-sided etching, and the upper and lower surface patterns are the same. In the first photolithographic etching, the sum of the etching depths of the upper and lower surface side grooves is the final thickness value of the beam splitter window.

Embodiment 3

[0080] Example 3: For a grid beam splitter with a structure such as Figure 8 The shape of k is made, and the material is a double-sided polished silicon wafer with high flatness and high parallelism. Its production process is as follows:

[0081] 1. Evaporating aluminum film or thermally grown silicon dioxide or evaporating silicon nitride and other metal films or dielectric films or composite films on the cleaned double-sided polished single crystal silicon surface as a masking film;

[0082] 2. Photolithography to expose the side groove pattern, and remove the masking film in the side groove pattern by etching to expose the surface of the single crystal silicon. Using ICP or RIE technology for side grooves, the corrosion depth is equal to the final thickness of the beam splitter window; besides the figure shown, the shape of the side grooves can also be formed by multiple rectangles, squares, circles, ellipses or other polygonal shapes arranged at a certain distance. beco...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A snapshot imaging spectrometer based on a micro-imaging mirror array and a stepped phase mirror relates to the technical field of infrared imaging spectral detection instruments, and solves the problems of real-time acquisition of three-dimensional data cubes in traditional imaging spectrometers and the miniaturization of imaging spectroscopy instruments, including collimating mirrors, Micro imaging mirror array, beam splitter, horizontal stepped phase mirror, vertical stepped phase mirror, relay imaging mirror and area array detector. An imaging spectroscopy instrument that uses a micro-imaging mirror array to perform multiple imaging of the target scene, and uses a stepped phase mirror to perform distributed phase modulation on multiple image fields. The parallel imaging channel formed by the micro-imaging mirror array and the parallel imaging channel formed by the stepped phase mirror The light field coupling between the interference channels realizes the multi-channel snapshot interference imaging of the target scene without the need for complex motion mechanisms, and has the advantages of miniature, static, strong stability, high integration, and fast detection speed.

Description

technical field [0001] The present invention relates to a snapshot infrared interference imaging spectrometer in the technical field of infrared imaging spectrum detection instruments, in particular to a method that uses a micro-imaging mirror array for multiple imaging and uses stepped phase mirrors to perform distributed phase modulation on the light field of each imaging channel Multi-channel micro-snapshot infrared interferometric imaging spectrometer to achieve interference. Background technique [0002] Image features and spectral features are important means for people to identify substances. Effective detection of target image and spectral features can greatly improve people's ability to understand the world. Imaging feature detection is used to record the position and intensity information of objects, while spectral feature detection obtains wavelength-related information based on the emission, reflection, and transmission spectra unique to different substances. Wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01J3/28G01J3/02
CPCG01J3/0208G01J3/2823
Inventor 梁静秋梁中翥孟德佳陶金吕金光王维彪秦余欣
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap