Hydrofluoric acid arsenic removal process

A hydrofluoric acid and process technology, applied in the chemical industry, can solve problems such as unqualified single cations, and achieve the effects of loose process conditions, simple and easy operation, and guaranteed product quality.

Inactive Publication Date: 2018-10-02
XUANCHENG HENGTAI ELECTRONICS CHEM MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the shortcomings of using potassium permanganate as an oxidant in the prior art to easily introduce impurities such as manganese, potassium, iron, and sulfate radicals to cause unqualified single cations, and propose a kind of hydrofluoric acid for removing arsenic craft

Method used

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  • Hydrofluoric acid arsenic removal process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] 1) Take a sample from the anhydrous hydrogen fluoride from which arsenic is to be removed, and titrate the reducing substances in the sample with hydrogen peroxide solution to obtain the amount of hydrogen peroxide T to be consumed by the sample;

[0038] 2) After chemical pretreatment, the anhydrous hydrogen fluoride to be removed for arsenic is fed into the first elevated tank (1) through the feed pump, and then the anhydrous hydrogen fluoride in the first elevated tank (1) is passed into the rectification tower ( 2) Medium distillation for 1h;

[0039] 3) Pass the distilled anhydrous hydrogen fluoride in step 2) through the condenser (3) into the absorption tower (4), and then add the second high-level tank (5) to the absorption tower (4) High-purity water to obtain 30% hydrogen fluoride solution;

[0040] 4) Use methods such as controlling spray density and gas-liquid ratio to further purify the high-purity hydrofluoric acid solution in step 3) and enter the third high-le...

Embodiment 2

[0044] 1) Take a sample from the anhydrous hydrogen fluoride from which arsenic is to be removed, and titrate the reducing substances in the sample with hydrogen peroxide solution to obtain the amount of hydrogen peroxide T to be consumed by the sample;

[0045] 2) After chemical pretreatment, the anhydrous hydrogen fluoride to be removed for arsenic is fed into the first elevated tank (1) through the feed pump, and then the anhydrous hydrogen fluoride in the first elevated tank (1) is passed into the rectification tower ( 2) Medium distillation for 1h;

[0046] 3) Pass the distilled anhydrous hydrogen fluoride in step 2) through the condenser (3) into the absorption tower (4), and then add the second high-level tank (5) to the absorption tower (4) High-purity water to obtain a 40% hydrogen fluoride solution;

[0047] 4) Use methods such as controlling spray density and gas-liquid ratio to further purify the high-purity hydrofluoric acid solution in step 3) and enter the third high-...

Embodiment 3

[0051] 1) Take a sample from the anhydrous hydrogen fluoride from which arsenic is to be removed, and titrate the reducing substances in the sample with hydrogen peroxide solution to obtain the amount of hydrogen peroxide T to be consumed by the sample;

[0052] 2) After chemical pretreatment, the anhydrous hydrogen fluoride to be removed for arsenic is fed into the first elevated tank (1) through the feed pump, and then the anhydrous hydrogen fluoride in the first elevated tank (1) is passed into the rectification tower ( 2) Medium distillation for 1h;

[0053] 3) Pass the distilled anhydrous hydrogen fluoride in step 2) through the condenser (3) into the absorption tower (4), and then add the second high-level tank (5) to the absorption tower (4) High-purity water to make 50% hydrogen fluoride solution;

[0054] 4) Use methods such as controlling spray density and gas-liquid ratio to further purify the high-purity hydrofluoric acid solution in step 3) and enter the third high-leve...

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Abstract

The invention relates to the technical field of chemical engineering, in particular to a hydrofluoric acid arsenic removal process. The process includes steps: 1) sampling from anhydrous hydrogen fluoride to be subjected to arsenic removal, and adopting hydrogen peroxide solution for titration of reducing substances in a sample to obtain hydrogen peroxide consumption T of the sample; 2) after chemical pretreatment, feeding the anhydrous hydrogen fluoride to be subjected to arsenic removal into a first elevated tank through a feeding pump, feeding anhydrous hydrogen fluoride in the first elevated tank into a rectifying tower, and distilling for 1h; 3) feeding anhydrous hydrogen fluoride distilled in the step 2) into an absorption tower through a condenser, and adding high-purity water in asecond elevated tank into the absorption tower to obtain 30%-50% hydrogen fluoride solution. By adoption of hydrogen peroxide as an oxidizing agent for hydrofluoric acid arsenic removal, process conditions are loose, simplicity, convenience and feasibility in operation are realized, extraneous impurities are avoided, and accordingly product quality stability is guaranteed, and production efficiency is improved.

Description

Technical field [0001] The invention relates to the technical field of chemical engineering, in particular to a process for removing arsenic from hydrofluoric acid. Background technique [0002] Hydrofluoric acid is an aqueous solution of hydrogen fluoride gas, a clear, colorless, smoky corrosive liquid with a strong irritating odor. The melting point is -83.3℃, ​​the boiling point is 19.54, the flash point is 112.2℃, and the density is 1.15g / cm³. Easily soluble in water and ethanol, slightly soluble in ether. Because the ability of hydrogen atoms and fluorine atoms to bond is relatively strong, hydrofluoric acid cannot be completely ionized in water, so in theory, low-concentration hydrofluoric acid is a weak acid. [0003] In the process of producing electronic grade hydrofluoric acid, heavy metal arsenic exists in a trivalent state. Since the boiling point of trivalent arsenic is almost equal to hydrofluoric acid, it cannot be removed regardless of distillation or degassing. I...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/19
CPCC01B7/195C01B7/196
Inventor 江伟胡洪峰谢钺
Owner XUANCHENG HENGTAI ELECTRONICS CHEM MATERIAL
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