Fluorine tin modified boron-doped diamond film electrode, preparation method and application thereof
A thin-film electrode and electrode technology, which is applied in the field of boron-doped diamond thin-film electrode and its preparation, can solve the problems of covering up the excellent properties of BDD, and achieve the effects of uniform particles, tight combination, and increased conductivity
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[0032] This embodiment provides a fluorine tin modified BDD film electrode and a preparation method thereof. The preparation method comprises the following steps:
[0033] (1) Cut the Si sheet into small pieces of 15mm×15mm as the substrate, polish it with sandpaper and boil it for 15 minutes; then grind the silicon substrate with 0.5 μm diamond paste for 10 minutes, and then use acetone, absolute ethanol, deionized Ultrasonic cleaning with water for 5 minutes, and finally drying to obtain a pretreated silicon substrate;
[0034] Put the pre-treated silicon substrate into the 3KPa pressure hot wire vapor deposition chamber, pass hydrogen, methane, and borane into the deposition chamber at a volume ratio of 98:2:0.2, and use tungsten wire as the hot wire. The distance between the wire and the silicon substrate is 8mm, and the temperature of the hot wire is 850°C; adjust the control voltage, increase the current passing through the hot wire, and increase the temperature of the ...
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