Safe, efficient and environmentally-friendly fertilization method for after-wheat dry-cultivated direct-seeded japonica rice in northern Jiangsu area
A fertilization method and dry direct seeding technology, which is applied in the field of safe, efficient and environmentally friendly fertilization of japonica rice after dry direct seeding in northern Jiangsu, can solve the problems of over 40°C or even over 55°C, increased evaporation, and low demand, and can prevent fertilizer efficiency. Delay problem, control and reduce ammonia volatilization loss, and improve the effect of utilization efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment Construction
[0023] The inventor has been engaged in the research and promotion of rice and wheat cultivation technology in northern Jiangsu for a long time. The invention has demonstrated a total of more than 30,000 mu from 2011 to 2017. Typical demonstration sites include: Huaiyin District Rice and Wheat Original Seed Farm and surrounding towns, Huaiyin District Li Town, Dadong Town and Zhuma Town in Lianshui County. The specific technical solutions are:
[0024] 1. Immediately after harvesting the wheat, fertilize immediately after the stubble, bury the straw for soil preparation, and sow seeds; if there are irrigation conditions, irrigate the seedlings with water within 2 days after sowing; if there are no irrigation conditions, follow the plowing and sowing, and carry out strong suppression in time after sowing , subject to the fact that people walk without getting stuck after the suppression.
[0025] 2. The base fertilizer is only 45% (15-15-15) compound fertilizer 20kg / mu, and ure...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com