Silicon nitride crucible and preparation method thereof

A silicon nitride crucible and crucible technology, which is applied in the field of photovoltaic and semiconductor device production, can solve the problems of limited single service life, can not be reused, cell attenuation, etc., achieve long service life, avoid the diffusion and introduction of oxygen , the effect of long service life
CN108752007APending Publication Date: 2018-11-06็Ž‹้‡‘ๆณข

Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
็Ž‹้‡‘ๆณข
Publication Date
2018-11-06
Patent Text Reader

Abstract

The invention discloses a silicon nitride crucible which is prepared from one or more of the following raw materials of powder, a barium-containing compound, SiO2, aluminum oxide, mullite, a dispersant, high-purity deionized water, an organic matter monomer, a cross-linking agent, an initiator, a catalyst, a polymerization inhibitor and an adhesive. The invention discloses a method of preparing the silicon nitride crucible with sintering after reaction. The method comprises the following steps of 1) preparing an Si-based green body with a gel casting method or a slip casting method; 2) performing nitridation at 1000-1500 DEG C; 3) performing high-temperature gas pressure sintering; and 4) performing post-treatment. The invention also discloses a method for preparing the silicon nitride crucible with high-temperature gas pressure sintering. The method comprises the following steps of 1) preparing an Si3N4-based green body with the gel casting method or the slip casting method; and 2) performing high-temperature gas pressure sintering. The prepared silicon nitride crucible has the advantages of high-temperature resistance, low oxygen content, long service life and capability of repeated use for a long time and has a wide market prospect.
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Description

technical field

[0001] The invention relates to the technical field of photovoltaic and semiconductor device production, in particular to a silicon nitride crucible and a preparation method thereof. Background technique

[0002] At present, more than 95% of semiconductor devices and more than 99% of integrated circuits are made of Si materials, and more than 95% of photovoltaic power plants are made of Si cells. Si materials are divided into two types: polycrystalline and single crystal. At present, a circular quartz crucible is used to prepare Si single crystal, and a square quartz ceramic crucible is used to prepare Si polycrystalline. Quartz ceramic crucibles have the following fatal weaknesses: 1) Softening and crystallization at high temperatures are prone to safety accidents such as Si leakage due to cracking of the crucible; The service life of conventional Si polycrystalline quartz crucible is about 3 days, and the service life of conventional Si single crystal quar...

Claims

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