Silicon nitride crucible and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ็้ๆณข
- Publication Date
- 2018-11-06
Abstract
Description
technical field
[0001] The invention relates to the technical field of photovoltaic and semiconductor device production, in particular to a silicon nitride crucible and a preparation method thereof. Background technique
[0002] At present, more than 95% of semiconductor devices and more than 99% of integrated circuits are made of Si materials, and more than 95% of photovoltaic power plants are made of Si cells. Si materials are divided into two types: polycrystalline and single crystal. At present, a circular quartz crucible is used to prepare Si single crystal, and a square quartz ceramic crucible is used to prepare Si polycrystalline. Quartz ceramic crucibles have the following fatal weaknesses: 1) Softening and crystallization at high temperatures are prone to safety accidents such as Si leakage due to cracking of the crucible; The service life of conventional Si polycrystalline quartz crucible is about 3 days, and the service life of conventional Si single crystal quar...