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Absorbing material and preparation method thereof

A technology of absorbing materials and matrix materials, applied in the field of materials, can solve the problems of sacrificing the absorbing properties of materials, high patch density, poor designability, etc., achieving good designability, ensuring wave absorption performance, and strong designability Effect

Active Publication Date: 2019-01-01
LUOYANG INST OF CUTTING EDGE TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Commonly used dispersion methods (such as surface modification) cannot meet the requirements of cutting long carbon nanotubes. The use of dispersants can only maintain the dispersed state of carbon nanotubes. Although ultrasonic dispersion can cut long carbon nanotubes, it will cause carbon nanotubes to form A large number of aggregates, ball milling dispersion not only easily destroys the structural integrity of carbon nanotubes, but also cannot ensure a good dispersion state of carbon nanotubes. Due to the random distribution of carbon nanotubes in the matrix, the effective microscopic conductive network formed is uncontrollable , the designability is poor, and it also affects the absorbing performance of the material. In this way, although this method solves the problem of high patch density of the absorbing material, it also sacrifices the absorbing performance of the material at the same time.

Method used

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  • Absorbing material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Add the hollow glass microspheres to the sodium hydroxide solution to prepare a hollow glass microsphere solution with a mass fraction of 5%, stir at 70°C for 40 minutes, filter, and then add SnCl 2 -HCl solution, 50 ° C ultrasonic vibration for 60 minutes, filtered, and then added to PdCl 2 -HCl solution, 50 ℃ ultrasonic vibration for 60min activation, after that, in the electrolyte composed of nickel salt, iron salt, conductive salt, pH buffer solution, with nickel and iron as the anode, on the surface of the activated hollow glass microspheres Plating a uniform nickel layer and iron layer to obtain the magnetic hollow microspheres;

[0027] In parts by mass, 100 parts of two-component polyurethane composed of polyisocyanate and hydroxyl resin are dissolved in 30 parts of ethyl acetate solvent to form the ethyl acetate solution of two-component polyurethane; Add 260 parts of magnetic hollow microspheres in batches to the solution, then add 5 parts of anti-aging agent...

Embodiment 2

[0029] Add hollow glass microspheres to potassium hydroxide solution to prepare a hollow glass microsphere solution with a mass fraction of 10%, stir at 80°C for 20 min, filter, and then add SnCl 2 -HCl solution, 30 ℃ ultrasonic vibration for 80min, filtered, then added to PdCl 2 -HCl solution, 30 ℃ ultrasonic vibration for 80min activation, after that, in the electrolyte composed of nickel salt, iron salt, conductive salt, pH buffer solution, with nickel and iron as the anode, on the surface of the activated hollow glass microspheres Plating a uniform nickel layer and iron layer to obtain the magnetic hollow microspheres;

[0030]In parts by mass, 80 parts of two-component polyurethane composed of polyisocyanate and hydroxyl resin are dissolved in 25 parts of ethyl acetate solvent to form the ethyl acetate solution of two-component polyurethane; Add 220 parts of magnetic hollow microspheres in batches to the solution, then add 3 parts of anti-aging agent RD, use a high-speed...

Embodiment 3

[0032] Add hollow glass microspheres to sodium hydroxide solution to prepare a hollow glass microsphere solution with a mass fraction of 10%, stir at 60°C for 40 min, filter, and then add SnCl 2 -HCl solution, 70 ° C ultrasonic vibration for 40 minutes, filtered, and then added to PdCl 2 -HCl solution, 70 ℃ ultrasonic vibration for 40min activation, after that, in the electrolyte composed of nickel salt, iron salt, conductive salt, pH buffer solution, with nickel and iron as the anode, on the surface of the activated hollow glass microspheres Plating a uniform nickel layer and iron layer to obtain the magnetic hollow microspheres;

[0033] In parts by mass, 100 parts of two-component polyurethane composed of polyisocyanate and hydroxyl resin are dissolved in 20 parts of ethyl acetate solvent to form the ethyl acetate solution of two-component polyurethane; Add 200 parts of magnetic hollow microspheres in batches to the solution, and then add 5 parts of anti-aging agent N-isop...

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Abstract

The invention provides an absorbing material and a preparation method thereof. The absorbing material comprises a base material; an absorbent; an anti-aging agent; and a solvent, wherein the absorbentcomprises magnetic hollow microspheres made of hollow glass microspheres The absorbing material reduces the density of the material while ensuring the absorbing property and the mechanical property,and can effectively meet the requirement of light weight of the material.

Description

technical field [0001] The invention relates to the field of materials, more specifically, to a wave-absorbing material and a preparation method thereof. Background technique [0002] Polymer-based absorbing materials are mainly prepared by filling the polymer matrix with absorbing agents such as ferrite, carbonyl iron, alloy powder, etc. For sheet absorbing materials such as absorbing patches, the absorbing agent Both the content and the thickness of the patch will affect the wave-absorbing performance of the material. Although the larger filling amount and thickness are conducive to the improvement of the wave-absorbing performance, the density of the material is too high to meet the requirements of light weight, which makes the wave-absorbing The application of material patches is subject to certain restrictions. [0003] In order to solve the problem of high density of the wave-absorbing material patch, there are currently some attempts to reduce the weight of the wave-...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L75/04C08K5/18C08K9/02C08K7/28C09K3/00
CPCC09K3/00C08K5/18C08K7/28C08K9/02C08K2201/003C08L75/04
Inventor 不公告发明人
Owner LUOYANG INST OF CUTTING EDGE TECH
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