Top-emitting OLED device with cathode single-sided grating and preparation method thereof
A top emission and grating technology, applied in the field of top emission OLED devices and their preparation, can solve the problems of preparing gratings and the like, and achieve the effects of less process, low cost, and improved luminous efficiency
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Embodiment 1
[0035] 1) Prepare the substrate 10, which is an ITO-coated glass substrate. Sonicate with acetone, absolute ethanol, and deionized water for 10 minutes, then blow dry with nitrogen, and finally heat in a vacuum oven at 80° C. for 30 minutes.
[0036] 2) Preparation of a top-emitting OLED device 2 suitable for monochromatic green light. The existing commonly used green OLED structure is adopted. in 3×10 -4 100nm Al is vapor-deposited under Pa pressure environment to form metal anode 11, and then successively vapor-deposits 10nm molybdenum trioxide (MoO 3) as hole injection layer 12, 52 nm of N,N'-diphenyl-N,N'-(1-naphthyl)-1,1'-biphenyl-4,4'-diamine (NPB) as Hole transport layer 13, 20nm 8-hydroxyquinoline aluminum (Alq 3 ) as the OLED light-emitting layer 14 suitable for green light, 15nm phenanthroline (BPhen) doped with lithium (Li) (BPhen: Li) as the electron injection layer 16 to reduce the electron injection barrier and improve conductivity. 10nm of BPhen is used as t...
Embodiment 2
[0041] 1) Prepare the substrate 10, which is an ITO glass substrate. Sonicate with acetone, absolute ethanol, and deionized water for 20 minutes respectively, then blow dry with nitrogen, and finally heat in a vacuum oven at 90° C. for 20 minutes.
[0042] 2) Preparation of a top-emitting OLED device 2 suitable for white light. The existing common white light OLED structure is adopted. at 3×10 - 4 The metal anode 11 is formed by evaporating 100nm Al under Pa pressure environment, and then depositing a hole injection layer 12 with a thickness of 5nm in sequence. Triphenylamine) is formed, 40nm thick hole transport layer 13, hole transport layer 13 adopts TAPC (two-[4-(N,N-xylyl-amino)-phenyl] cyclohexane) to form, redeposition OLED light-emitting layer 14, OLED light-emitting layer 14 includes a 19nm-thick blue light unit and a 1nm-thick yellow light unit, which can emit white light. Pyridyl)phenyl-(2-carboxypyridyl)iridium(III)) is doped with host material mCP(N,N′-dicarba...
Embodiment 3
[0047] 1) Prepare the substrate 10, the substrate 10 is an ITO glass substrate, ultrasonically use acetone, absolute ethanol, and deionized water for 30 minutes, then blow dry with nitrogen, and finally heat in a vacuum oven at 100°C for 10 minutes .
[0048] 2) Preparation of a top-emitting OLED device 2 suitable for white light. The existing common white light OLED structure is adopted. at 3×10 - 4 The metal anode 11 is formed by evaporating 100nm Al under Pa pressure environment, and then depositing a hole injection layer 12 with a thickness of 5nm in sequence. Triphenylamine) is formed, 40nm thick hole transport layer 13, hole transport layer 13 adopts TAPC (two-[4-(N,N-xylyl-amino)-phenyl] cyclohexane) to form, redeposition OLED light-emitting layer 14, OLED light-emitting layer 14 includes a 19nm-thick blue light unit and a 1nm-thick yellow light unit, which can emit white light. Pyridyl)phenyl-(2-carboxypyridyl)iridium(III)) is doped with host material mCP(N,N′-dic...
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