Waste liquid treatment device and waste liquid treatment method

Abstract

The invention provides a waste liquid treatment device and a waste liquid treatment method. The device comprises a storage groove, an ion exchange system, a Fenton reaction system, a flocculation system and a biochemical treatment system which are sequentially communicated, the waste liquid in a storage tank sequentially passes through the ion exchange system, the Fenton reaction system and the flocuulation system, the ion exchange system is used for removing heavy metal ions in the waste liquid, the Fenton reaction system is used for degrading nitrogen-containing hybrid organic compounds in the waste liquid, the flocculation system is used for removing small molecular organics and inorganic salt in the waste liquid to greatly improve the biodegradability of the waste liquid reaching the biological treatment system so that the biochemical treatment system can perform deep biochemical treatment on the waste liquid to completely degrade the waste liquid, and water pollution is effectively prevented.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a waste liquid treatment device and a waste liquid treatment method. Background technique [0002] Thin-film transistor (TFT) technology is a large-scale semiconductor integrated circuit technology using new materials and new processes. It constructs extremely fine various film, and process the film by etching, peeling, etc., to manufacture integrated circuits. [0003] In the past, the metal wiring or electrodes of liquid crystal display devices were mostly made of aluminum or aluminum alloy, and the etching solution system was generally a mixture of inorganic acids. With the development of display technology, especially the development of display technology towards large-scale and high-resolution, traditional metal wires will increase with the length of the wiring and the resistance will increase, thereby amplifying problems such as signal delay and causing display effects. ...

AI Technical Summary

Problems solved by technology

[0004] In the prior art, the copper acid etching solution mainly includes high-concentration organic substances such as hydrogen peroxide (about 18%), organic acids, and nitrogen-containing hybrid substances (such as pyrrole, azole, nitrogen pentacycline), and hydrogen peroxide. The main function is to etch the copper film. However, after the copper wire or copper electrode is etched, there are still a large amount of hydrogen peroxide, organic acid, and nitrogen-containing hybrid substances in the copper acid etching waste liquid, and the copper acid etch The etching waste liquid also contains a large amount of copper ions (Cu 2+ ), the copper acid etching waste liquid cannot be discharged directly, on the one hand because of heavy metal pollution, on the other hand because it contains a large amount of organic matter that is difficult to be biodegraded in the natural environment

At present, there are certain difficulties in the degradation and recycling of copper acid etching waste liquid, and it is difficult to treat Cu 2+ Effective recovery, and a large amount of organic matter that is difficult to degrade leads to high chemical oxygen demand (COD) content in wastewater, poor biodegradability, and difficult biochemical treatment

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