Preparation method of optical film of five-channel multicolor optical filter

Abstract

The invention relates to the technical field of preparation of optical films and specifically to a preparation method of an optical film of a five-channel multicolor optical filter. The preparation method comprises the steps of firstly cleaning a vacuum chamber and a substrate; then placing the substrate into the vacuum chamber for vacuumizing; after the substrate is heated to 200 DEG C, cleaningthe substrate by adopting an ion beam bombardment; then depositing a titanium oxide film and a silicon dioxide film alternately one layer by one layer at one side of the substrate by adopting an electronic gun evaporation method to form a film system 1; then depositing a titanium oxide film and a silicon dioxide film alternately one layer by one layer at the other side to form a film system 2, a film system 3, a film system 4, a film system 5 and a film system 6; taking out the film systems after the film systems are cooled to the room temperature; testing the film systems by adopting a spectrophotometer; calculating the spectral lines by adopting UVWINLAB software; testing according to testing requirements about film surface quality, adhesive force and environmental performances of the Standard 'QJ1697-89' of Department of Space.

Description

technical field [0001] The invention relates to the technical field of optical film preparation, in particular to a method for preparing an optical film layer of a five-channel multicolor filter. Background technique [0002] In the current multi-spectral and full-spectrum imaging systems of remote sensing detection systems, there is an urgent need for an ~895±9nm, 450±5~800±9nm, the optical filter with a transmittance of 90% in the five spectral channels, and has the function of suppressing the optical signal in the range of 300~1100nm to reduce the influence of signal noise . [0003] However, due to the narrow coating area of ​​each passband of the optical filter under this requirement, all within 3mm, the coating process is more difficult, and the product involves more film systems, which are more complicated. According to The traditional design idea is to plate different long-wave pass and short-wave pass film systems on both sides of the substrate. A total of 10 film...

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Problems solved by technology

[0003] However, due to the narrow coating area of ​​each passband of the optical filter under this requirement, all within 3mm, the coating process is more difficult, and the product involves more film systems, which are more complicated. According to The traditional design idea is to plate different long-wave pass and short-wave pass film systems on both sides of the substrate. A total of 10 film systems need to be plated, and each film system needs to protect the non-coating area during plating. The process is more complicated and the yield is very low

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