Micro hollow silicon needle tube array and a manufacturing method thereof
A manufacturing method and technology of hollow silicon, applied in microstructure technology, other medical devices, microstructure devices, etc., can solve the problem of high processing cost of micro-hollow silicon needle tube arrays, reduce the size of hollow micro-needle tube tips, and increase the volume of liquid in silicon tubes. Needle tube flow resistance and other issues, to achieve the effect of light weight, simple structure, and reduce production costs
Inactive Publication Date: 2019-05-24
HUAZHONG UNIV OF SCI & TECH
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[0005] In view of the above defects or improvement needs of the prior art, the present invention provides a micro-hollow silicon needle tube array and a manufacturing method thereof. According to the characteristics and requirements of the micro-hollow silicon tube array, the SOI silicon chip substrate and MEMS processing technology are fully utilized Based on the advantages, the manufacturing method of the hollow silicon needle array was redesigned, and a micro hollow silicon needle array was obtained correspondingly, which reduced the diameter of the microfluidic channel of the hollow silicon needle and the volume and weight of the silicon-based array, and further increased Increase the flow resistance of the liquid in the silicon needle tube, and reduce the tip size of the hollow microneedle tube at the same time, thereby solving the technical problems of high processing cost, long time-consuming, and limited processing accuracy of the micro-hollow silicon needle tube array in the prior art
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[0075] The fabrication steps of the hollow silicon needle tube array include:
[0076] (1) 2.2-micron silicon dioxide is deposited on both sides of the SOI silicon wafer.
[0077] (2) The silicon dioxide of the SOI device layer is patterned to form a mask pattern for deep silicon etching, and a circular hole structure with a 5-micron diameter inside the silicon needle tube is etched by an inductively coupled plasma (ICP) deep silicon etching process. Etched to the buried oxide layer (thickness 100 microns).
[0078] (3) In the same step, a circular hole structure of the storage solution is etched on the back substrate, with a diameter of 300 microns, and is etched to a buried oxide layer (thickness of 500 microns).
[0079] (4) Remove the photoresist of the device layer and perform the second patterning. During patterning, the new photoresist will cover the circular hole structure etched for the first time. The resist does not flow into it but forms a mask over it.
[0080]...
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Abstract
The invention belongs to the technical field of micro silicon needle tubes, and particularly relates to a micro hollow silicon needle tube array and a manufacturing method thereof. The invention relates to a micro hollow silicon needle tube array and a preparation method thereof. The advantages of the SOI silicon wafer substrate and the MEMS processing technology are fully utilized; the manufacturing method of the hollow silicon needle tube array is redesigned in a targeted manner; Accordingly, the micro hollow silicon needle tube array is obtained. The micro-flow pipeline diameter of the hollow silicon needle tube and the size and weight of the silicon-based array are reduced, the flow resistance of liquid in the silicon needle tube is further increased, meanwhile, the tip size of the hollow micro-needle tube is reduced, and therefore the technical problems that in the prior art, a micro-hollow silicon needle tube array is high in machining cost, long in consumed time, limited in machining precision and the like are solved.
Description
technical field [0001] The invention belongs to the technical field of micro silicon needle tubes, and more particularly relates to a micro hollow silicon needle tube array and a manufacturing method thereof. Background technique [0002] Hollow microneedles have broad application prospects in new instruments such as ion emission sources, inkjet printers, and transdermal drug delivery devices. For example, under the action of the electric field force, the working medium in the ion jet electric propulsion system is ionized and ejected from the hollow micro-needle tube array to achieve thrust. Since the generated thrust is directly related to the jet flow rate of the working medium, the size of the micro-fluidic pipe of the needle tube is It determines the lower limit and resolution of ion jet thrust. Therefore, how to fabricate high-precision hollow microneedles is the key issue for realizing electric propulsion technology. In addition, in the transdermal drug delivery tech...
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IPC IPC(8): B81C1/00A61M37/00
Inventor 宋培义涂良成匡双阳孙雷蒙张开
Owner HUAZHONG UNIV OF SCI & TECH