Preparation of rubidium-doped nickel oxide thin film and application of thin film being hole transporting layer to perovskite solar cell
A technology of nickel oxide and perovskite, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of difficult control of the microstructure and morphology of the perovskite layer, low device fill factor and short-circuit current, and high crystal size dependence , to achieve high photoelectric conversion efficiency, reduce nickel defects, and good hole mobility
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Embodiment 1
[0027] Example 1: Preparation of pure nickel oxide as a hole transport layer and its application in reverse planar perovskite solar cells.
[0028] Step 1: Clean the surface of ITO glass (1.5 cm*1.5 cm), and clean the surface with ultraviolet ozone for 10 min.
[0029]Step 2: Dissolve 0.3 g nickel acetate tetrahydrate in 10 g ethylene glycol solution containing 0.1 g diethylamine, and stir overnight at room temperature to form a green nickel oxide precursor solution. The mixed precursor solution of nickel oxide was spin-coated on the substrate at a speed of 3000 r, followed by annealing at 200 °C for 10 min and 380 °C for 20 min to prepare a nickel oxide film, and put the nickel oxide film in a glove box
[0030] Step 3: In the glove box, place 439 mg of PbI 2 , 37 mg PbBr 2 , 120 mg FAI, 32 mg MAI, and 26 mg CsI were dissolved in 0.8 mL of mixed solvent (DMF:DMSO = 4:1 (v / v)) and stirred to obtain a perovskite precursor solution. The body solution was spin-coated on the ni...
Embodiment 2
[0033] Example 2: Preparation of rubidium-doped nickel oxide film as a hole transport layer and its application in reverse plane perovskite solar cells.
[0034] Except for step 2, all steps and methods are exactly the same as in the foregoing embodiment 1.
[0035] Step 2: Dissolve 0.3 g nickel acetate tetrahydrate and 28 mg rubidium acetate in 10 g ethylene glycol solution containing 0.1 g diethylamine, and stir overnight at room temperature to form a green rubidium-doped nickel oxide precursor solution. The mixed precursor solution of rubidium-doped nickel oxide was spin-coated on the substrate at a speed of 3000 r, followed by annealing at 200 °C for 10 min and at 380 °C for 20 min to prepare the rubidium-doped nickel oxide thin film.
[0036] Implementation effect: Finally, elemental analysis of nickel oxide and rubidium-doped nickel oxide films, characterization of electrical conductivity, morphology, and energy levels, as well as perovskite film morphology and perovskit...
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