A vacuum gauge and its working method

A vacuum gauge and tungsten trioxide technology, applied in vacuum gauges, instruments, measuring devices, etc., can solve the problems of high electric field or magnetic field applied by vacuum ionization gauges, complex structure, large volume, etc., and meet the requirements of low test conditions and volume. Small, configurable effects

Active Publication Date: 2020-07-14
EAST CHINA NORMAL UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this vacuum gauge has a large measurement range, it has a complex structure and a large volume, and it needs to be calibrated under different gases when it is used.
In addition, the vacuum ionization meter needs to apply a high electric field or magnetic field when using it, which is very unfavorable for workers wearing electronic medical devices such as cardiac pacemakers

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A vacuum gauge and its working method
  • A vacuum gauge and its working method
  • A vacuum gauge and its working method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] A preparation of a vacuum gauge and a working method thereof, comprising the following steps:

[0035] Step 1: Choose flexible natural mica as the substrate. Use blades or ultrasonic methods to obtain mica flakes with a surface roughness below 1 nm.

[0036] Step 2: Put a metal mask on the mica sheet, and use laser deposition technology to deposit a rectangular WO on the hollow mask. 3 ditch. The parameters used in the laser deposition process are: substrate temperature 500 °C, laser wavelength 248 nm, laser energy 1.2 J cm -2 , pulse frequency 5 Hz, oxygen bias 13 Pa, WO 3 The film thickness is 100 nm.

[0037] Step 3: Align the metal mask plate with the electrode shape hollowed out to the channel, and use thermal evaporation technology to vapor-deposit Cr / Au metal electrodes with a thickness of 110 nm as the gate, source and drain.

[0038] Step 4: Cut a piece of the prepared ion gel and stick it on the channel and the electrode with a thickness of 500 µm.

[00...

Embodiment 2

[0041] A preparation of a vacuum gauge and a working method thereof, comprising the following steps:

[0042] Step 1: Choose flexible natural mica as the substrate. Use blades or ultrasonic methods to obtain mica flakes with a surface roughness below 1 nm.

[0043] Step 2: Put a metal mask on the mica sheet, and use laser deposition technology to deposit a rectangular WO on the hollow mask. 3 ditch. The parameters used in the laser deposition process are: substrate temperature 500 °C, laser wavelength 248 nm, laser energy 1.2 J cm -2 , pulse frequency 5 Hz, oxygen bias 13 Pa, WO 3 The film thickness is 100 nm.

[0044]Step 3: Align the metal mask with the electrode shape hollowed out to the channel, and use magnetron sputtering technology to vapor-deposit ITO transparent electrodes with a thickness of 110 nm as the gate, source and drain.

[0045] Step 4: Cut a piece of the prepared ion gel and stick it on the channel and the electrode with a thickness of 500 µm.

[0046...

Embodiment 3

[0048] A preparation of a vacuum gauge and a working method thereof, comprising the following steps:

[0049] Step 1: Select Rigid Substrate SiO 2 / Si as the substrate. Use acetone and ethanol to ultrasonically clean for 5 minutes to ensure the surface is clean.

[0050] Step 2: On SiO 2 A metal mask is placed on the / Si substrate, and a rectangular WO is deposited on the hollow mask using laser deposition technology. 3 ditch. The parameters used in the laser deposition process are: substrate temperature 500 °C, laser wavelength 248 nm, laser energy 1.2 J cm -2 , pulse frequency 5 Hz, oxygen bias 13 Pa, WO 3 The film thickness was 100 nm.

[0051] Step 3: Align the metal mask with the electrode shape hollowed out to the channel, and use magnetron sputtering technology to vapor-deposit ITO transparent electrodes with a thickness of 110 nm as the gate, source and drain.

[0052] Step 4: Cut a piece of the prepared ion gel and stick it on the channel and the electrode with...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
widthaaaaaaaaaa
lengthaaaaaaaaaa
Login to view more

Abstract

The invention discloses a vacuum gauge and an operating method thereof. The core of the vacuum gauge is a planar thin film transistor structure composed of a tungsten trioxide thin film channel, ion gel, a source, a drain and a gate, wherein the source and the drain are connected to the two ends of the tungsten oxide thin film channel respectively; the gate is isolated from the channel; the ion gel covers the channel surface and is connected to the gate. The source, the drain and the gate are connected to an external voltage and current test source gauge to form a complete vacuum gauge. By applying a small bias voltage to the gate, the resistance of the tungsten trioxide thin film channel can be controlled, and the resistance variation amplitude of the tungsten trioxide thin film has a significant linear relationship with the degree of vacuum. Based on the principle, the vacuum gauge of the invention is simple in structure, flexible to configure, large in range, low in cost, small in volume and low in energy consumption. In addition, if a flexible mica substrate is used, the vacuum gauge can be operated in a bent state, which can meet the test requirements of devices having different internal geometric configurations.

Description

technical field [0001] The invention relates to a vacuum gauge and its working method. A new method of vacuum degree measurement is realized by using the linear variation relationship between the resistive amplitude of the tungsten trioxide thin film channel and the vacuum degree under the action of grid voltage. Background technique [0002] A vacuum gauge is an instrument that measures the pressure of a gas below one atmospheric pressure, and is widely used in scientific research and industrial production. At present, there are many kinds of vacuum gauges with different measurement ranges and measurement accuracy, which are suitable for different test requirements. [0003] Generally, the vacuum gauge uses the change law of a certain physical effect of the gas under different air pressures to measure the air pressure. According to the different physical mechanisms of vacuum gauges to measure air pressure, they are mainly divided into three categories, namely, vacuum gaug...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/786H01L21/34G01L21/00
Inventor 向平华徐冬冬钟妮彭晖段纯刚
Owner EAST CHINA NORMAL UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap