Application of preferred indium tin oxide with (400) crystal plane on transparent thin-film thermocouple
A technology of indium tin oxide and transparent thin film, which is applied in the direction of directly heat-sensitive electrical/magnetic element thermometers, heat measurement, and electrical devices, etc., which can solve the high cost and power consumption of indium tin oxide transparent thin film thermocouples Time length, anti-oxidation failure and other issues, to achieve the effect of facilitating large-scale industrial production, high Seebeck coefficient, and simple preparation
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Embodiment 1
[0020] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1 The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 1500nm; Then, using the method of DC pulse magnetron sputtering at natural room temperature with the above-mentioned quartz plate deposited with zinc-aluminum oxide as the base material, the figure 2 The mask plate shown is placed on the base material...
Embodiment 2
[0025] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1 The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 1500nm; Then, use the method of radio frequency magnetron sputtering to use the above-mentioned quartz sheet deposited with zinc-aluminum oxide as the base material at natural room temperature, such as figure 2 The mask plate shown is placed on the ba...
Embodiment 3
[0030] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1 The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 600nm; Then, using the method of DC pulse magnetron sputtering at natural room temperature with the above-mentioned quartz plate deposited with zinc-aluminum oxide as the base material, the figure 2 The mask plate shown is placed on the base material,...
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