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Application of indium tin oxide with (400) crystal plane preference on transparent thin film thermocouple

An indium tin oxide and transparent film technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problem of high cost, long time consumption, anti-oxidation failure, etc. of indium tin oxide transparent film thermocouples problem, to achieve the effect of convenient large-scale industrial production, high Seebeck coefficient, and simple preparation

Active Publication Date: 2019-06-14
DALIAN JIAOTONG UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the ordinary indium tin oxide film has a non-preferential polycrystalline center cubic ferromanganite phase structure. When measuring temperature in air, due to the non-preferential polycrystalline center cubic ferromanganite phase indium tin oxide film will react with oxygen in the air reaction, resulting in an irreversible change in the electrical properties of the indium tin oxide film, which in turn leads to a lower Seebeck coefficient for the thin-film thermocouple, which eventually leads to a decrease in the temperature measurement accuracy of the thin-film thermocouple
[0003] At present, in order to overcome the problem of unstable Seebeck coefficient in the temperature measurement process of indium tin oxide transparent film thermocouples, it is necessary to prepare a dense anti-oxidation coating on the surface of indium tin oxide film transparent film thermocouples, such as: SiO 2 、Al 2 o 3 、SiN x , AlN x etc., but these methods all have some deficiencies, such as: the larger stress in the anti-oxidation coating will destroy the indium tin oxide film material; the larger stress in the anti-oxidation coating will lead to anti-oxidation The coating is broken and peeled off, which leads to the failure of anti-oxidation; in the process of preparing the anti-oxidation coating, it is necessary to discharge to the outside the environment containing Cl, F, CO x , NH x , NO x Exhaust gases such as harmful gases, causing environmental pollution; the prepared indium tin oxide transparent film thermocouple has problems such as high cost, long time consumption, and low efficiency

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  • Application of indium tin oxide with (400) crystal plane preference on transparent thin film thermocouple
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  • Application of indium tin oxide with (400) crystal plane preference on transparent thin film thermocouple

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Embodiment 1

[0021] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1 The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 1500nm; Then, using the method of DC pulse magnetron sputtering at natural room temperature with the above-mentioned quartz plate deposited with zinc-aluminum oxide as the base material, the figure 2 The mask plate shown is placed on the base material...

Embodiment 2

[0026] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1 The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 1500nm; Then, use the method of radio frequency magnetron sputtering to use the above-mentioned quartz sheet deposited with zinc-aluminum oxide as the base material at natural room temperature, such as figure 2 The mask plate shown is placed on the ba...

Embodiment 3

[0031] An application of indium tin oxide with (400) crystal face preference on a transparent thin film thermocouple, using a DC pulse magnetron sputtering method at natural room temperature with a quartz plate as the base material, such as figure 1The mask plate shown is placed on the base material, and the zinc-aluminum oxide is used as the sputtering target. The purity of the zinc-aluminum oxide is 99.99%, wherein: the mass percentage of zinc oxide is 98wt.%. The mass percentage is 2wt.%, with argon as the sputtering gas, the purity of argon is 99.99%, and the zinc-aluminum oxide film electrode in the transparent film thermocouple is prepared by magnetron sputtering, and the thickness of the zinc-aluminum oxide film pole is 600nm; Then, using the method of DC pulse magnetron sputtering at natural room temperature with the above-mentioned quartz plate deposited with zinc-aluminum oxide as the base material, the figure 2 The mask plate shown is placed on the base material, ...

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Abstract

The invention relates to an application of indium tin oxide with (400) crystal plane preference on a transparent thin film thermocouple, and belongs to the technical field of thin film thermocouples.The body-centered cubic ferromanganese phase polycrystalline indium tin oxide with (400) crystal plane preference is made into one pole of the transparent thin film thermocouple by a direct current pulse magnetron sputtering method, and the duty ratio of the direct current pulse magnetron sputtering is 10-40%. According to the application of indium tin oxide with (400) crystal plane preference onthe transparent thin film thermocouple, the preferred orientation of the indium tin oxide film obtained by direct current pulse magnetron sputtering is controlled, so that the indium tin oxide transparent film thermocouple has the higher Zeebek coefficient.

Description

technical field [0001] The invention relates to the application of indium tin oxide with (400) crystal plane preference on a transparent thin-film thermocouple, and belongs to the technical field of thin-film thermocouples. Background technique [0002] Thin-film thermocouples have the advantages of low fabrication cost, high sensitivity, and short response time. At present, thin film thermocouples are mainly composed of metal materials, such as: Pt, Ni 90 Cr 10 、Ni 95 Si 5 etc. The above-mentioned metal thin-film thermocouples are opaque in the visible light range, but in some special fields, the thin-film thermocouples are required to be transparent in the visible light range, such as: the lens surface of the space telescope, the glass surface of the spacecraft, Surfaces of solar panels, etc. Indium tin oxide thin film materials are an important class of transparent conductive materials, which have important applications in the field of photoelectric conversion, such ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/35
Inventor 丁万昱刘浩陈卫超
Owner DALIAN JIAOTONG UNIVERSITY
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