Simple and efficient preparation method for silicon nickel cobalt iron photoanode
A photoanode, NiCoFe technology, applied in the field of preparation of SiNiCoFe photoanode, can solve the problems of restricting large-scale mass production and high difficulty in operation, achieving controllable synthesis rate, good repeatability and strong controllability Effect
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[0042] A simple and efficient preparation method of silicon nickel cobalt iron photoanode includes the following steps:
[0043] S1. Dissolve nickel sulfate, cobalt sulfate, and ferrous sulfate in deionized water, purge and stir, and configure to form an electrodeposition solution;
[0044] S2. Immerse the packaged silicon photoanode in the electrodeposition solution configured in step S1, and perform electrodeposition in the constant current mode of the electrochemical workstation to obtain the target product: silicon / nickel-cobalt-iron photoanode.
[0045] As a further solution, the specific configuration method of the electrodeposition solution in step S1 is: dissolving a mol of nickel sulfate, b mol of cobalt sulfate, and cm of ferrous sulfate in 100 mL of deionized water, and venting nitrogen or argon. Purge and stir for 10-20 minutes to form an electrodeposition solution, where a+b+c=0.01 mol, a is 0.002 to 0.009, b is 0.0005 to 0.004, and c is 0.0005 to 0.004.
[0046] As a fur...
Embodiment 1
[0051] Example 1: Please refer to Figure 1-2 .
[0052] 1) Dissolve 0.002mol of nickel sulfate, 0.004mol of cobalt sulfate, and 0.004mol of ferrous sulfate in 100mL of deionized water to obtain a mixed solution of nickel sulfate, cobalt sulfate, and ferrous sulfate in deionized water, and blow with nitrogen or argon. Sweep and stir for 10min;
[0053] 2) Extend the sealed silicon photoanode (working electrode), silver / silver chloride electrode (reference electrode) and platinum electrode (counter electrode) into 3cm below the liquid surface of the deionized water mixed solution for electrodeposition;
[0054] 3) When performing electrodeposition, set the electrochemical workstation to constant current mode, and the current density is 1mA / cm 2 , The deposition time is 1000s, and the deposition temperature is 20°C. After the electrodeposition, the silicon / nickel-cobalt-iron photoanode was rinsed with deionized water for 30 seconds to obtain the target product.
Embodiment 2
[0055] Example 2: Please refer to Figure 3-4 .
[0056] 1) Dissolve 0.005 mol of nickel sulfate, 0.0025 mol of cobalt sulfate, and 0.0025 mol of ferrous sulfate in 100 mL of deionized water to obtain a mixed solution of nickel sulfate, cobalt sulfate, and ferrous sulfate in deionized water, and blow nitrogen or argon. Sweep and stir for 10min;
[0057] 2) Extend the sealed silicon photoanode (working electrode), silver / silver chloride electrode (reference electrode) and platinum electrode (counter electrode) into 3cm below the liquid surface of the deionized water mixed solution for electrodeposition;
[0058] 3) When performing electrodeposition, set the electrochemical workstation to constant current mode, and the current density is 1mA / cm 2 , The deposition time is 1000s, and the deposition temperature is 20°C. After the electrodeposition, the silicon / nickel-cobalt-iron photoanode was rinsed with deionized water for 30 seconds to obtain the target product.
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