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Preparation method and application of a cobalt-tantalum-zirconium alloy target

A zirconium alloy and target technology, which is used in the preparation of cobalt-tantalum-zirconium alloy targets, can solve the problems of substandard magnetic permeability, uneven texture, coarse grains, etc., and reduce the anisotropy field and coercivity. , the effect of increasing nucleation points and uniform internal organization

Active Publication Date: 2020-08-11
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of the problems in the prior art that the cobalt-tantalum-zirconium alloy target used for magnetron sputtering has coarser grains, uneven texture and substandard magnetic permeability, the purpose of the present invention is to provide a method for preparing a cobalt-tantalum-zirconium alloy target And its application, through composition design, high vacuum vertical melting + high vacuum electron beam melting, three-dimensional isothermal hot forging blanking and variable angle control rolling process, etc., to control the structure of the alloy and the performance of the target material, to prepare high-quality cobalt tantalum zirconium alloy target

Method used

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  • Preparation method and application of a cobalt-tantalum-zirconium alloy target
  • Preparation method and application of a cobalt-tantalum-zirconium alloy target

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Embodiment 1

[0042] This embodiment provides a method for preparing a cobalt-tantalum-zirconium alloy target, which includes the following steps:

[0043] Cobalt powder (purity is 99.995%), zirconium powder (purity is 99.99%), tantalum powder (purity is 99.99%), hafnium powder (purity is 99.99%), boron powder (purity is 99.99%) under 200MPa pressure cold Vacuum vertical melting treatment is carried out after isostatic pressing, the vertical melting temperature is 1350°C, and the vacuum degree is 10 -4 Pa, to obtain the Co-6.0Ta-3.0Zr-1.5Hf-0.01B alloy billet; the vertical melting cobalt billet is 10 -4 Melting in a Pa electron beam melting furnace, the melting temperature is 1600°C, after cooling, the ingot is again placed in a high vacuum -4 Melting in a Pa electron beam melting furnace at a melting temperature of 1600°C (each melting time is 0.5 hours); the obtained high-density billet is covered with stainless steel in an argon chamber; the wrapped billet is heated to 1000°C and kept w...

Embodiment 2

[0059] This embodiment provides a method for preparing a cobalt-tantalum-zirconium alloy target, which includes the following steps:

[0060] Cobalt powder (purity is 99.995%), zirconium powder (purity is 99.99%), tantalum powder (purity is 99.99%), hafnium powder (purity is 99.99%), boron powder (purity is 99.99%) under 200MPa pressure cold Vacuum vertical melting treatment is carried out after isostatic pressing, the vertical melting temperature is 1200 ℃, and the vacuum degree is 10 -4 Pa, to obtain the Co-9.0Ta-5.0Zr-2.0Hf-0.01B alloy billet; the vertical melting cobalt billet is 10 -4 Melting in a Pa electron beam melting furnace, the melting temperature is 1550°C, after cooling, the ingot is again placed in a high vacuum -4 Melting in a Pa electron beam melting furnace at a melting temperature of 1550°C (each melting time is 0.5 hours); the obtained high-density billet is covered with stainless steel in an argon chamber; the wrapped billet is heated to 1000°C and kept w...

Embodiment 3

[0065] This embodiment provides a method for preparing a cobalt-tantalum-zirconium alloy target, which includes the following steps:

[0066] Cobalt powder (purity is 99.995%), zirconium powder (purity is 99.99%), tantalum powder (purity is 99.99%), hafnium powder (purity is 99.99%), boron powder (purity is 99.99%) under 200MPa pressure cold Vacuum vertical melting treatment is carried out after isostatic pressing, the vertical melting temperature is 1380°C, and the vacuum degree is 10 -4 Pa, to obtain the Co-3.0Ta-2.0Zr-1.0Hf-0.01B alloy billet; the vertical melting cobalt billet is 10 -4 Melting in a Pa electron beam melting furnace, the melting temperature is 1700°C, after cooling, the ingot is again placed in a high vacuum -4 Melting in a Pa electron beam melting furnace at a melting temperature of 1700°C (each melting time is 0.5 hours); the obtained high-density billet is covered with stainless steel in an argon chamber; the wrapped billet is heated to 1000°C and kept w...

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Abstract

The invention discloses a preparing method and application of a cobalt tantalum zirconium alloy target material, and belongs to the technical field of preparation of special materials. The preparing method comprises the steps of component design, high-vacuum vertical sintering and high-vacuum electron beam melting, three-dimensional isothermal hot forging cogging, angle-varying controlled rollingand the like. In this way, the organization structure of the alloy and the performance of the target material are controlled, and the high-quality cobalt tantalum zirconium alloy target material is prepared. The oxygen content of the cobalt tantalum zirconium alloy target material is smaller than or equal to 15 ppm, the average grain size of the cobalt tantalum zirconium alloy target material is 5-20 micrometers, the phase distribution of the target material is uniform, the magnetic permeability is larger than 40%, and the heterogeneity of magnetic permeability is smaller than 2%. By means ofthe designed process, the oxygen content, organization structure heterogeneity and magnetic performance of the finished product target material can be effectively controlled, and a raw material guarantee is provided for sputtering high-quality thin films by means of the preparing method.

Description

technical field [0001] The invention belongs to the technical field of preparation of special materials, and in particular relates to a preparation method and application of a cobalt-tantalum-zirconium alloy target. Background technique [0002] Cobalt-based alloy thin film materials have the characteristics of high magnetic permeability, high saturation magnetization, high resistivity, high cut-off frequency, low coercivity, etc., and are ideal raw materials for micro-inductance components and magnetic recording components. Cobalt-tantalum-zirconium alloy is an important soft magnetic material with good magnetization properties, and is one of the important raw materials for magnetic recording materials in the new generation of information technology industry. However, due to its high magnetic permeability, in the process of magnetron sputtering, severe magnetic shielding makes the magnetic field passing through the surface of the target less, making it difficult for magnetr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22C19/07C22C1/04C22C1/02B22F3/04C22F1/10C23C14/35B21J5/00
CPCB21J5/002B22F3/04C22C1/02C22C1/0433C22C19/07C22F1/10C23C14/3414C23C14/35
Inventor 肖柱方梅李周朱云天陈志永
Owner CENT SOUTH UNIV
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