Orthodontic clamp with PVD coating and preparation method thereof
A coating and orthodontic technology, applied in coating, metal material coating technology, orthodontics and other directions, can solve the problems of high cost of cemented carbide, damage of orthodontic forceps, blackening of cemented carbide, etc. Production cost, convenient manufacturing process, and the effect of increasing the bonding force
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Embodiment 1
[0034] The method for preparing the orthodontic forceps with PVD coating of the present invention comprises the steps:
[0035] (1) taking stainless steel as a raw material to manufacture orthodontic pliers rough blanks, and overall heat-treating the orthodontic pliers rough blanks;
[0036] (2) Finishing the rough orthodontic pliers to a preset shape;
[0037] (3) heat-treating the matrix at the jaws of the orthodontic pliers beak region again;
[0038] (4) Depositing a titanium compound coating on the beak region of the pliers by physical vapor deposition to obtain the orthodontic pliers with PVD coating.
[0039] During heat treatment in step (1), annealing treatment: heat up at 70°C / h to 750°C, hold for 3 hours, cool at 50°C / h to 500°C, and air-cool when out of the furnace; quenching treatment: quenching temperature is 850°C, hold for 30 minutes, and water-cool 10s, then the oil is cooled to room temperature; tempering treatment: conduct the first tempering at 480°C, hol...
Embodiment 2
[0046] The difference from Example 1 is that the titanium-containing compound coating prepared by PVD deposition is TiAlN, and the specific operation of the coating is: first deposit 5min TiN as a transition layer, adjust the pressure to 0.3Pa~1.2Pa, and open the Ti arc target at the same time material and Al arc target, the target bias voltage of Ti arc target is -10V~-100V, the target power is 0.2kW~1.0kW, the target bias voltage of Al arc target is -10V~-100V, and the target power is 0.2kW~0.8kW, wherein the substrate bias voltage is -50V~-150V, the power is 1.5kW~2.0kW; the deposition temperature is 460~480℃, the deposition time is 5~10min, and the nitrogen flow rate is adjusted to 100sccm~200sccm.
[0047] Specifically, the target bias voltage of the Ti arc target is -50V, the target power is 0.5kW, the target bias voltage of the Al arc target is -100V, the target power is 0.6kW, and the substrate bias voltage is -150V, and the power is 1.5 kW; the deposition temperature ...
Embodiment 3
[0049] It differs from Example 1 in that the titanium-containing compound coating prepared by PVD deposition is TiCN, and the specific operation of the coating is as follows: the vacuum degree of the coating chamber is 3 × 10-3Pa, and argon gas is introduced until the pressure is 1Pa. Glow cleaning was performed, followed by metal ion cleaning under high bias, and pure titanium was deposited as a transition layer for 3 min. Adjust the pressure to 0.3Pa ~ 1.6Pa, turn on the Ti arc target, the target bias voltage of the Ti arc target is -50V ~ -100V, the power is 1kW ~ 4kW, and the bias voltage is applied to the substrate during the deposition process, and the bias voltage is - 50V~-300V, the power is 1.5kW~2kW, the deposition temperature is 100~550℃, and the deposition time is 5~10min. N introduced during deposition 2 and CH 4 The flow ratio is 1:2~4.
[0050] Specifically, the target bias of the Ti arc target is -50V, the target power is 2kW, the substrate bias is -200V, an...
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