Graphene nanopore sequencer and sequencing method thereof
A technology of graphene nanopore and sequencer, which is applied in biochemical equipment and methods, instruments, biochemical instruments, etc., can solve the problem of difficult collection of sufficient effective data points at the speed of DNA passing through the hole, and achieve high resolution and control effect Good, high control precision effect
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Embodiment 1
[0047] Such as Figure 1-3 As shown, a graphene nanopore sequencer includes a probe nano-motion platform 1, an AFM probe 2, a nanopore chip 3, a hydrophobic liquid pool 4, and a three-dimensional nano-motion platform 5; the AFM probe 2 is clamped on the probe On the nano motion platform 1, the hydrophobic liquid pool 4 is fixed on the three-dimensional nano motion platform 5, the nanopore chip 3 is installed in the hydrophobic liquid pool 4; the tip of the AFM probe 2 is provided with a DNA tetrahedron 23; the nanopore chip 3 is engraved with The solid nanopore 30 is etched and the solution inside the hydrophobic liquid pool 4 communicates through the nanopore 30 , and several magnetic beads 7 are arranged in the solution below the nanopore 30 .
[0048] In this embodiment, the longitudinal closed-loop stroke of the probe nano-motion platform 1 is greater than 25 μm, and its closed-loop resolution is less than 0.3 nm; the three-dimensional closed-loop stroke X / Y / Z of the three...
Embodiment 2
[0067] A graphene nanopore 30 sequencer, basic structure is similar to embodiment one, and its difference is:
[0068] In this embodiment, the AFM probe 2 is a silicon nitride probe, and the shape of the tip is tetrahedral.
[0069] In this embodiment, the thin film deposition method of the gold modification layer 21 is selected as atomic layer deposition, and the thickness of the gold modification layer 21 is 50 nm.
[0070] In this embodiment, the thin film deposition method of the isolation layer 22 is atomic layer deposition, the material of the isolation layer 22 is aluminum oxide, and the thickness is 20 nm.
[0071] In this embodiment, the micro-nano fabrication technology is selected as focused ion beam, the focused ion beam ion source is selected as gallium ions, the etching radius is 10 nm, and the etching depth is 25 nm.
[0072] In this embodiment, the edge length of the DNA tetrahedron 23 is 17 bp, approximately 5.8 nm, and the specific method for the self-assemb...
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