Perovskite film and perovskite solar cell and preparation method thereof
A solar cell and perovskite technology, applied in circuits, electrical components, photovoltaic power generation, etc., can solve the problems that are not suitable for the preparation of large-area and uniform perovskite films, so as to improve photoelectric conversion performance and long-term stability, crystallization The effect of high precision and simple method
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Embodiment 1
[0051] A method for preparing a perovskite solar cell as described above is provided, comprising the steps of:
[0052] R1. Prepare perovskite precursor solution: dissolve 0.159g methylammonium iodide and 0.461g lead iodide in a mixed solvent of dimethyl sulfoxide and N,N-dimethylformamide, the volume of the two The ratio is 1:9, and the mass fraction of solute is 45wt%.
[0053] R2. Preparation of 4-iodopyrazole mixed solution: Weigh a certain amount of 4-iodopyrazole powder and add it to the fully dissolved perovskite precursor solution. The mass fraction of 4-iodopyrazole is 1 wt%.
[0054] R3. Cleaning the substrate: Use cleaning agent, deionized water, acetone, and isopropanol to ultrasonically clean the FTO conductive glass, dry it with nitrogen, and then treat it with UV-ozone for half an hour.
[0055] R4. Preparation of the electron transport layer: Spin-coat a tin oxide-isopropanol solution with a particle diameter of 2 nm to 10 nm and a mass fraction of 2.5% on the...
Embodiment 2
[0061] Provide another method for preparing a perovskite solar cell as described above, comprising the steps of:
[0062] S1. Cleaning the substrate: Use cleaning agent, deionized water, acetone, and isopropanol to ultrasonically clean the ITO conductive glass, dry it with nitrogen, and then treat it with UV-ozone for half an hour.
[0063] S2. Preparation of the hole transport layer: spin-coat the PTAA chlorobenzene solution with a concentration of 10 mg / mL on the substrate, and bake at 150° C. for 10 min to obtain a hole transport layer with a film thickness of 30 nm.
[0064] S3. The substrate deposited with the hole transport layer is placed in the film forming cavity, and the vacuum degree in the film forming cavity is controlled at 10 -8 Pa~10 5 Between Pa, the substrate is heated at the same time, and the heating temperature of the substrate is controlled at 30°C to 150°C.
[0065] S4. The precursors lead iodide, lead bromide, methyl hydrobromide, formamidine hydriodi...
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