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Photosensitive resin composition, application thereof and color filter

A color filter, photosensitive resin technology, applied in the field of photoresist, can solve the problems of incomplete inverted trapezoidal structure, low curing degree, insufficient polymerization degree, etc., to improve the surface concentration, optimize the surface flatness, The effect of increasing the degree of response

Pending Publication Date: 2020-06-23
GUAN ETERNAL MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most photosensitive resin compositions still have the problems of insufficient polymerization degree and low curing degree in the upper corner part of the inverted trapezoid formed in the developing process, and fracture occurs in the developing process, forming an incomplete inverted trapezoidal structure
This incomplete inverted trapezoidal structure will form a larger slope angle after the post-baking process, exceeding the specifications of the color filter
[0004] CN102778813A discloses a photosensitive resin composition, which includes 5%-45% alkali-soluble resin, 0.5%-18% photosensitive monomer containing ethylenically unsaturated double bonds, 4%-15% pigment, 0.1%-3 % photoinitiator, 40% to 64.4% solvent, 0.1% to 7% polymeric silane coupling agent and 0.1% to 1% auxiliary agent, the photosensitive resin composition can be used to make COA structural panels, using the The photosensitive resin composition is used as a color photoresist, and smooth edges and small slope angles can be obtained after development, which provides the conditions for making a continuous ITO film on the color layer, but there are still inverted trapezoidal triangles formed in the development process. The problem of low curing degree, after being washed by the developer, it is easy to break, and instead forms a large slope angle, which is contrary to the target product
[0005] CN102650827A discloses a photosensitive resin composition and a liquid crystal display using it, which solves the problem that the existing photosensitive resin composition has poor surface smoothness and adhesion, which causes the display performance of the liquid crystal display to be affected
Since the photosensitive resin composition contains a specific alkali-soluble resin, it has both excellent developability, high-definition pattern linearity and contour angle, but the inverted trapezoidal triangular region formed by the photosensitive resin composition during the developing process The degree of polymerization is not high, and it is easily broken by the developer, forming a rough surface and a large angle of slope

Method used

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  • Photosensitive resin composition, application thereof and color filter
  • Photosensitive resin composition, application thereof and color filter
  • Photosensitive resin composition, application thereof and color filter

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0063] The preparation method of modified photoinitiator 1 is as follows:

[0064] (1) In a four-necked bottle equipped with a stirrer, a thermometer, a chlorine protection device and a dropping funnel, under a chlorine atmosphere, add hydrogen-containing silicone oil 1 (n≤20) 100 parts by weight, and 800 parts by weight of organic solvent acrylate, heated to 116° C., added 30 parts by weight of chloroplatinic acid through a dropping funnel, and reacted for 3 hours. After the reaction is complete, gradually lower the temperature to room temperature under stirring, extract with toluene, and remove the toluene by distillation to obtain an intermediate product.

[0065] (2) In the there-necked flask equipped with agitator, thermometer and dropping funnel, add photoinitiator 4,4-bis(diethylamino)benzophenone 100 parts by weight and 1000 parts by weight of toluene, heated to dissolve the photoinitiator, heated to 85°C, added 50 parts by weight of the intermediate product, and pl...

preparation example 2

[0070] The difference from Preparation Example 1 is that hydrogen-containing silicone oil 1 is replaced by hydrogen-containing silicone oil 2 (n 1 +n 2 ≤20), obtaining the modified photoinitiator 2 with a yield of 89.2%

[0071] Structure Characterization:

[0072] (1) Dissolve modified photoinitiator 2 in tetrahydrofuran, use Waters-Breeze GPC gel permeation chromatography to characterize, record M w = 2890, PDI = 1.026.

[0073] (2) Use nuclear magnetic resonance spectrometer equipment to characterize, under 400MHz with CDCl 3 into the solvent 1 H NMR test, the results are as follows: δ=0.15ppm (12H, s), 0.62ppm (6H, s), 1.18ppm (12H, t), 2.85ppm (2H, t), 7.36~7.72ppm (7H, t) .

preparation example 3

[0075] The difference from Preparation Example 1 is that hydrogen-containing silicone oil 1 is replaced by hydrogen-containing silicone oil 3 (n 1 +n 2 ≤20), obtaining yield is 89.5% modified photoinitiator 3: mixture.

[0076] Structure Characterization:

[0077] (1) Dissolve modified photoinitiator 3 in tetrahydrofuran, use Waters-Breeze GPC gel permeation chromatography to characterize, record M w = 3050, PDI = 1.158.

[0078] (2) Use nuclear magnetic resonance spectrometer equipment to characterize, under 400MHz with CDCl 3 into the solvent 1 H NMR test, the results are as follows: δ=0.14ppm (12H, s), 0.61ppm (6H, s), 1.17ppm (12H, t), 2.80ppm (2H, t), 7.35~7.71ppm (7H, t) .

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Abstract

The invention provides a photosensitive resin composition, application thereof and a color filter. The photosensitive resin composition comprises a modified photoinitiator, alkali-soluble resin and amonomer, wherein the modified photoinitiator is formed by connecting a benzophenone main group and a hydrogen-containing silicone oil substituent group. The photosensitive resin composition is appliedto the color filter. The color filter comprises the photosensitive resin composition which is subjected to photocuring. According to the photosensitive resin composition provided by the invention, the curing degree of a chamfer formed in an exposure process is relatively high, the chamfer is not easy to be broken by a developing solution, and a slope angle with a proper angle and a smooth surfacecan be obtained.

Description

technical field [0001] The invention relates to the technical field of photoresist, in particular to the technical field of color photoresist, in particular to a photosensitive resin composition and its application, and a color filter. Background technique [0002] The color filter is an important component of the liquid crystal display panel, through which the liquid crystal display can achieve visual colorization. The performance index of the color photoresist used to prepare the color filter directly affects the display effect of the liquid crystal panel. The preparation of color filters mainly utilizes the photoinitiated curing mechanism of photoinitiators. Photocuring technology is a new type of advanced material surface treatment technology, which has the characteristics of high efficiency, high quality, environmental protection, and energy saving. [0003] The preparation of color filters includes three parts: red, green and blue, RGB, but the process of each part is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G03F7/00G02B5/20
CPCG03F7/027G03F7/004G03F7/0007G02B5/20
Inventor 王石进孙涛刘永祥桑伟任雪艳
Owner GUAN ETERNAL MATERIAL TECH
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