Homologous metal gradient material and preparation method and application thereof

A gradient material and metal technology, applied in chemical instruments and methods, catalyst activation/preparation, electrodes, etc., can solve the problems of precious metal platinum resources such as scarcity, unsuitability, and high price, and achieve excellent electrocatalytic hydrogen evolution performance and optimized hydrogen adsorption Good performance and stability

Active Publication Date: 2020-08-18
TSINGHUA BERKELEY SHENZHEN INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, precious metal platinum resources are scarce and expensive, which is

Method used

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  • Homologous metal gradient material and preparation method and application thereof
  • Homologous metal gradient material and preparation method and application thereof
  • Homologous metal gradient material and preparation method and application thereof

Examples

Experimental program
Comparison scheme
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Embodiment 1

[0046] see figure 1 , figure 1 It is a schematic diagram of the principle of preparing a homogeneous metal gradient material in this embodiment. This embodiment provides a homogeneous metal gradient material, which is prepared according to the following steps:

[0047] (1) Take metal tantalum foil (Ta foil, 2 cm x 2 cm), flatten it with a tablet machine, and then use laser technology to make holes to form porous metal tantalum foil, and carry out in the area of ​​1 cm x 1 cm of Ta foil Make pores with a diameter of 10 microns. Then use ethanol and water to ultrasonically clean in sequence, blow dry with a nitrogen gun, and package under inert atmosphere conditions for use.

[0048] (2) Take the above-mentioned porous metal tantalum foil and place it in a high-temperature heating furnace for chemical oxidation treatment, raise the temperature in the furnace to 500°C, the heating rate is 10°C / min, keep the temperature at 500°C for 15 minutes, stop heating and let the furnace c...

Embodiment 2

[0060] This embodiment provides a homologous metal (Ta) gradient material (Ta-TaS) treated by electrochemical cyclic voltammetry. 2 ), other conditions and steps are the same as in Example 1, the difference is that step (1) is: take metal tantalum foil (2 × 2 cm), flatten it with a tablet press, and use laser technology to make holes to form porous metal tantalum Foil, make holes in the area of ​​1 cm × 1 cm in the Ta foil, with a pore size of 50 microns. Ultrasonic cleaning with ethanol and water in sequence, drying with a nitrogen gun, and packaging under inert atmosphere conditions for use.

[0061] Figure 11 This is the pore size distribution diagram of the porous metal tantalum foil prepared in step (1) of this example. The sample pore size of the porous metal tantalum foil is about 50 microns, and the difference in pore size is within ±4 microns.

[0062] Figure 12 The homologous metal (Ta) gradient material (Ta-TaS) processed by electrochemical cyclic voltammetry f...

Embodiment 3

[0064] This embodiment provides a homologous metal (Ta) gradient material (Ta-TaS) treated by electrochemical cyclic voltammetry. 2 ), other conditions and steps are the same as in Example 1, except that step (4) is: the tantalum-tantalum sulfide sample obtained in step (3) is placed in the electrode holder as the cathode, the graphite rod is the anode, and the Ag The / AgCl electrode is the reference electrode, and the electrolyte is 0.5MH 2 SO 4 . Electrochemical cyclic voltammetry was used for processing, the scanning speed was set to 20mV / min, and the number of scanning was 5000 times. After the treatment is completed, the homogeneous metal (Ta) gradient material treated by electrochemical cyclic voltammetry is taken out, washed with a large amount of deionized water, dried with a nitrogen gun, and packaged under an inert atmosphere for use.

[0065] Figure 13 The homologous metal (Ta) gradient material (Ta-TaS) processed by electrochemical cyclic voltammetry for embod...

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Abstract

The invention discloses a homologous metal gradient material as well as a preparation method and application thereof, and the preparation method of the homologous metal gradient material comprises thefollowing steps: (1) taking a transition metal material for chemical oxidation treatment to form a transition metal-metal oxide material; and (2) adding a chalcogenide source into the transition metal-metal oxide material, introducing inert gas and reaction gas, forming a homologous metal gradient material through a reaction, and the reaction gas can reduce metal oxide in the transition metal-metal oxide material. The transition metal material is used as a substrate material, the homologous metal gradient material is prepared through in-situ derivation of the homologous metal, the stability is good, the electro-catalytic hydrogen evolution performance is superior to that of other transition metal-based catalysts, and the homologous metal gradient material has wide application prospects inwater electrolysis hydrogen production, supercapacitors and ion batteries.

Description

technical field [0001] The invention relates to the field of transition metal materials, in particular to a homologous metal gradient material and its preparation method and application. Background technique [0002] With the depletion of fossil energy and the deterioration of the environment, more and more research has begun to focus on green and non-polluting energy to promote the sustainable development of society. Among the many types of energy, hydrogen is clean, non-polluting, high energy density, and renewable, and is one of the energy carriers with the most potential for practical application in the future. Unlike traditional fossil energy sources, there is no large amount of hydrogen that can be directly utilized in nature. Therefore, large-scale and cheap production of hydrogen is the primary problem to be solved in the development of hydrogen energy. At present, the commonly used hydrogen production methods mainly include pyrolysis of natural gas, water gas metho...

Claims

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Application Information

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IPC IPC(8): B01J27/04B01J35/10B01J37/34B01J37/08B01J37/18B01J37/14C25B1/04C25B11/06H01M10/0525
CPCB01J27/04B01J35/1076B01J35/1004B01J37/348B01J37/08B01J37/18B01J37/14C25B1/04H01M10/0525C25B11/091Y02E60/10Y02E60/36
Inventor 刘碧录余强敏成会明
Owner TSINGHUA BERKELEY SHENZHEN INST
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