Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Preparation method and application of a PDMS and AAO double-layer embedded template for patterning polymer thin films

A technology of polymer film and patterning, applied in the direction of application, coating, flat products, etc., to achieve the effect of low cost, cheap price and simple production process

Active Publication Date: 2022-04-12
HUAIBEI NORMAL UNIVERSITY
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the soft template is not easy to be damaged and cracked during the imprinting process, there are still many things that need to be optimized, such as heat resistance, chemical stability, dimensional stability and pattern resolution, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method and application of a PDMS and AAO double-layer embedded template for patterning polymer thin films
  • Preparation method and application of a PDMS and AAO double-layer embedded template for patterning polymer thin films
  • Preparation method and application of a PDMS and AAO double-layer embedded template for patterning polymer thin films

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A method for preparing a PDMS and AAO double-layer embedded template in this embodiment comprises the following steps:

[0039] (1) Prepare 20mL of PDMS glue solution according to the formula ratio of PDMS glue solution of 5:1, and stir it with a stirrer for 0.5h at 0°C; then, put it in a vacuum drying oven and keep it under vacuum for 1h to eliminate Bubbles; after the bubbles are completely eliminated, store them in an airtight container at 0°C for later use.

[0040] (2) Double-pass anodized aluminum flakes were prepared by secondary anodization; high-purity aluminum flakes (purity: 99.999%, thickness: 0.3 mm) were used as raw materials, and washed in acetone and absolute ethanol solutions for 10 minutes respectively , and then dried; place the aluminum sheet in a muffle furnace at 450°C for 5 hours, and then cool it down to room temperature naturally; then, soak the aluminum sheet in 1mol / L sodium hydroxide solution for 15 minutes, and then wash it with deionized wa...

Embodiment 2

[0045] An application of the PDMS and AAO double-layer embedded template in the above-mentioned embodiment 1 of this embodiment, the PDMS and AAO double-layer embedded template is applied to the polymer film patterning:

[0046] (1) Prepare a polymer P3HT film with a thickness of 100nm by spin coating (spin coating speed 4000rpm), and place the side with the smooth hole structure of the PDMS and AAO double-layer embedded template and the polymer film face to face, as Figure 6 shown; then, at room temperature and 70bar pressure for 600s, such as Figure 7 As shown; finally, release the pressure, take out the template, and the polymer nanopillar film is successfully realized, as Figure 8 shown.

[0047] (2) Repeat the above steps to realize the preparation of large-area and batch-sized polymer P3HT nanocolumn films.

Embodiment 3

[0049] A method for preparing a PDMS and AAO double-layer embedded template in this embodiment comprises the following steps:

[0050] (1) Prepare 20mL of PDMS glue solution according to the formula ratio of PDMS glue solution of 5:1, and stir it with a stirrer for 0.5h at 0°C; then, put it in a vacuum drying oven and keep it under vacuum for 1h to eliminate Bubbles; after the bubbles are completely eliminated, store them in an airtight container at 0°C for later use.

[0051] (2) Double-pass anodized aluminum flakes were prepared by secondary anodization; high-purity aluminum flakes (purity: 99.999%, thickness: 0.3 mm) were used as raw materials, and washed in acetone and absolute ethanol solutions for 10 minutes respectively , and then dried; place the aluminum sheet in a muffle furnace at 450°C for 5 hours, and then cool it down to room temperature naturally; then, soak the aluminum sheet in 1mol / L sodium hydroxide solution for 15 minutes, and then wash it with deionized wa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
depthaaaaaaaaaa
Login to View More

Abstract

The invention provides a method for preparing a PDMS and AAO double-layer embedded template for polymer film patterning: firstly, prepare a PDMS solution; secondly, prepare an anodic aluminum oxide sheet by using a secondary anodic oxidation method, and remove the aluminum oxide film For the aluminum sheet of the base, put the AAO sheet into the phosphoric acid solution to pass through the holes, and after drying, a double-pass type AAO sheet is obtained; soak the sheet in the PDMS solution and remove the air bubbles, take out the AAO sheet filled with the PDMS solution, and scrape off the AAO sheet on one side The PDMS glue and contact this surface with tert-butanol, float the AAO sheet in the tert-butanol solution for cleaning, take out the AAO sheet with a smooth pore structure at one end, and then cross-link the remaining PDMS material. The present invention also provides an application of the above-mentioned PDMS and AAO double-layer embedded template. The template of the invention is simple to prepare, low in cost, has the advantages of both a hard template and a soft template, and has good application value.

Description

technical field [0001] The invention relates to the field of preparation of polymer patterned templates, in particular to a preparation method and application of a PDMS and AAO double-layer embedded template for polymer film patterning. Background technique [0002] With the development of nanotechnology and the in-depth study of functional polymer materials, the micro-nano patterning of polymer films has attracted extensive attention and attention. For example, the construction of polymer film nanopillar patterning is one of the important aspects. Compared with unpatterned polymer films, the construction of polymer nanopillar films exhibits a series of special material properties and potential applications, such as drug carriers, special active substrates, interface properties, optical properties, and optoelectronic properties. . Therefore, the performance optimization and application prospects of these functional materials are inseparable from the patterning process of p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08L83/04C08K3/22C25D11/12C25D11/16C25D11/08C25D11/10C25D11/24B29D7/01
CPCC08K3/22C25D11/045C25D11/12C25D11/16C25D11/08C25D11/10C25D11/24B29D7/01C08K2003/2227C08L83/04
Inventor 丁光柱刘结平
Owner HUAIBEI NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com