Micro thermal array based on heterogeneous driving unit and preparation method thereof
A driving unit and array technology, applied in the field of micro-electromechanical systems, can solve the problems of insufficient driving effect, long thermal response time, uneven distribution of temperature field, etc.
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[0053] The embodiment of the present invention also provides a method for preparing the micro-thermal array based on the heterogeneous driving unit, such as Figure 7 As shown, the implementation steps include:
[0054] S1, the substrate 1 (such as Figure 6 Shown in figure a in the middle) for cleaning and drying;
[0055] S2, prepare thin film resistance heater 21 on substrate 1, as Figure 6 As shown in Figure b ~ c in the middle;
[0056] S3, using a mask to prepare a wafer with a thermally conductive silicon column 22, such as Figure 6 As shown in the figure d in the middle;
[0057] S4, substrate 1 and wafer with thin film resistance heater 21 are bonded, as Figure 6 As shown in the figure e in the middle;
[0058] S5. Carry out the backside etching of the wafer according to the original mask for preparing the wafer with the thermally conductive silicon pillar 22 until the wafer is completely etched through, as Figure 6 As shown in the figure f in the middle; ...
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