Manufacturing method of super junction device
A manufacturing method and super junction technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as reducing device performance, and achieve the effect of improving performance
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[0097] Such as image 3 Shown is a flowchart of a method for manufacturing a super junction device according to an embodiment of the present invention; image 3 is described according to the lithography process level, a lithography process level includes multiple specific process steps, and a lithography process level only performs the lithography process corresponding to one mask. Such as Figure 4A to Figure 4N Shown is a schematic diagram of the device structure in each step of the manufacturing method of the super junction device in the embodiment of the present invention; the manufacturing method of the super junction device in the embodiment of the present invention includes steps:
[0098] Step 1, forming the gate structure, the gate structure is a trench gate, and the formation process of the trench gate includes:
[0099] A first epitaxial layer 2 with a first conductivity type is provided, and a photolithography process is performed to define a formation region of ...
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