Preparation method of silicon-based OLED micro-display

Abstract

The invention discloses a preparation method of a silicon-based OLED micro-display. The preparation method comprises the following steps: cleaning and drying a substrate of a silicon-based CMOS driving circuit containing an electrode; carrying out anodic coating on the substrate, coating photoresist with a first characteristic, and then carrying out exposure and development on the photoresist withthe first characteristic by using a first mask plate to form a first photoresist protection layer on the substrate; sequentially carrying out an anodic process on the substrate, and removing the first photoresist protection layer and positive photoresist generated in the anodic process, so an anodic protection layer exists on the electrode; performing a production-related processing step on the substrate including the anodic protection layer; coating the substrate with the photoresist with a second characteristic, carrying out exposure and development by using a second mask plate after the coating is finished, and performing etching to remove the anodic protection layer; after the anodic protection layer is removed, performing the packaging and circuit welding of the cover plate glass. According to the invention, the silicon-based OLED micro-display with no electrode corrosion phenomenon can be prepared.

Description

technical field [0001] The invention relates to the field of organic electroluminescent devices, in particular to a method for preparing a silicon-based OLED microdisplay. Background technique [0002] Silicon-based organic light-emitting diode (OLED, Organic Light Emitting Diode) microdisplay is a new type of display technology that manufactures active light-emitting devices OLED on silicon-based CMOS drive circuit substrates. It has been widely used in machine-worn helmets, gun sights , night vision devices and other military markets, and has extremely broad application prospects in the AR / VR market, and is known as the dark horse of the next generation of display technology. [0003] During the preparation of conventional silicon-based OLED microdisplays, when preparing the anode, anode insulating layer, OLED evaporation, cathode evaporation and thin film packaging, the electrodes on the CMOS circuit are exposed on the surface of the substrate. The anode, anode insulating...

AI Technical Summary

Problems solved by technology

[0003] During the preparation of conventional silicon-based OLED microdisplays, when preparing the anode, anode insulating layer, OLED evaporation, cathode evaporation and thin film packaging, the electrodes on the CMOS circuit are exposed on the surface of the substrate. The anode, anode insulating layer, In the production of thin film encapsulation layer, flat layer and color film, alkaline agents such as developer are used many times. The alkaline agent may corrode the metal in the electrode area, resulting in too much thinning of the electrode metal, which affects the connection of the electrodes. Sex, resulting in poor electrode connection

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