Method for welding magnesium oxide target to back plate
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 河南东微电子材料有限公司
- Publication Date
- 2021-02-12
- Estimated Expiration
- Not applicable · inactive patent
Smart Images

Figure 1 
Figure 2 
Figure 3
Abstract
Description
technical field
[0001] The invention belongs to the field of target material manufacture, and in particular relates to a magnesium oxide target material welding method. Background technique
[0002] Magnesium oxide targets are widely used in integrated circuits, flat panel displays, solar energy and other fields because of their high temperature stability, high dielectric constant, low dielectric loss and transparency to visible light. The magnesium oxide target needs to be connected with the metal back plate to form a target component, which is assembled together on the sputtering base and used as a cathode. The metal back plate plays the role of electrical and thermal conductivity and fixed support. During the sputtering process, the magnesium oxide target is bombarded by high-energy ions and heats up. If the welding bonding strength between the target and the back plate is low, it will cause the target to deform, crack, or even fall off the back plate under heated conditi...