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Titanium substrate with in-situ growth of metal nanoparticles on the surface and its application

A technology of in-situ growth of metal nanoparticles, applied in nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve the problem of uneven distribution of metal nanoparticles, inability to use in large quantities, and easy shedding of nanoparticles and other problems, to achieve the effect of mass production, simple and rapid preparation operation, and good chemical stability

Active Publication Date: 2021-09-24
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the problems that the surface of the enhanced Raman substrate prepared by the traditional method will have varying degrees of uneven distribution of metal nanoparticles, the nanoparticles are easy to fall off, the preparation process is cumbersome, and it cannot be used in large quantities. The present invention provides a method using in-situ chemical deposition The method, through a one-pot reduction reaction in the solution phase, directly obtains metal nanoparticles / titanium surface-enhanced Raman substrates, which improves the four major disadvantages of the above-mentioned traditional methods.

Method used

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  • Titanium substrate with in-situ growth of metal nanoparticles on the surface and its application
  • Titanium substrate with in-situ growth of metal nanoparticles on the surface and its application
  • Titanium substrate with in-situ growth of metal nanoparticles on the surface and its application

Examples

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Effect test

Embodiment 4

[0045]The theoretical calculation and simulation of picric acid solution in Example 4 uses Gaussion03 software.

Embodiment 1

[0047] Alkaline degreasing: configure NaOH (4wt%), Na 2 CO 3 (2wt%) solution of 100mL solution, a batch of 1cm x 3cm x 0.5cm titanium substrates were immersed in the solution, and ultrasonicated at 53kHz and 250W for 30min.

[0048] Oxalic acid etching: Rinse the titanium plate with clean water after degreasing and immerse it in a 20wt% oxalic acid solution to control the temperature of the solution at 98°C. After etching for 5 hours, take it out and clean it for later use.

[0049] Chemical growth of copper nanospheres: immerse the pretreated titanium plate in the prepared chemical deposition solution, including ammonium fluoride (8g / L), copper sulfate pentahydrate (20g / L), citric acid (20g / L ), sulfuric acid (0.8vol%), deposit at 20° C. for 3 minutes, take it out, clean it up, and dry it with nitrogen, and then prepare a titanium-based enhanced Raman substrate supported by copper nanospheres.

[0050] figure 1 It is a cold-field scanning electron microscope photo of the p...

Embodiment 2

[0053] Alkaline degreasing: 100mL solution of NaOH (10wt%) solution was prepared, a batch of 1cm×1cm×0.5cm titanium substrates were immersed in the solution, and ultrasound was performed at 53kHz and 250W for 1 hour.

[0054] Oxalic acid etching: Rinse the titanium plate with clean water after degreasing and immerse it in an oxalic acid (15wt%) solution to control the temperature of the solution to 98°C. After etching for 3 hours, take it out and clean it for later use.

[0055] Chemical growth of gold nanoflowers: immerse the pretreated titanium plate in the prepared chemical deposition solution, including ammonium fluoride (10g / L), chloroauric acid (1g / L), citric acid (20g / L) , hydrochloric acid (0.4vol%), deposited in a solution at 20° C. for 2 minutes, took it out and cleaned it, and dried it with nitrogen gas, so that the titanium-based enhanced Raman substrate supported by gold nanoflowers was prepared.

[0056] image 3 It is a cold-field scanning electron microscope p...

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Abstract

The invention discloses a titanium substrate with in-situ growth of metal nanoparticles on the surface and an application thereof, and belongs to the field of enhanced Raman substrate preparation technology and detection. In the present invention, the pretreated titanium substrate is immersed in the chemical deposition solution, deposited at 0-60°C for 30s-2 hours, cleaned and dried to obtain the titanium substrate with in-situ growth of metal nanoparticles on the surface, wherein the chemical deposition solution The components include 5-40g / L ammonium fluoride, 1-50g / L metal salt, 5-30g / L citric acid and 0.1-1vol% strong acid. The invention regulates the etching rate of particles on the surface of the titanium substrate and the diffusion rate of trivalent titanium ions, so that the metal particle reduction reaction occurs in solution near the surface of the substrate, so that metal elements are loaded on the surface of the titanium substrate in the form of nanoparticles. A more uniform, compact, and dead-angle-free nanoparticle layer is achieved on the titanium-based surface, which greatly improves the effect of surface-enhanced Raman.

Description

technical field [0001] The invention relates to a titanium substrate with in-situ growth of metal nanoparticles on the surface and an application thereof, belonging to the field of enhanced Raman substrate preparation technology and detection. Background technique [0002] Since the discovery of surface-enhanced Raman scattering in 1974, Raman detection has gradually become one of the most attractive analytical tools in the field of ultrasensitive detection. In terms of small molecule detection, surface-enhanced Raman technology is also considered to be one of the most promising research directions. By using surface-enhanced Raman imaging technology, it is also possible to obtain multi-target analysis and biological image signals with higher spatial resolution, enabling the visualization of distribution regions of different dopant materials. Label-free detection can also be achieved when analyzing various biological samples. With the introduction of electromagnetic field t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/40C23C18/44G01N21/65B82Y30/00B82Y40/00
CPCB82Y30/00B82Y40/00C23C18/40C23C18/44G01N21/658
Inventor 宋启军孙国巍王婵付程方御
Owner JIANGNAN UNIV
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