Antireflection film layer for photovoltaic glass, preparation method of antireflection film layer and solar cell module

A technology of anti-reflection film and photovoltaic glass, which is applied in photovoltaic power generation, electrical components, circuits, etc., can solve the problems of penetration, difficulty in removal, easy entry of pollutants or water vapor, etc., and achieve excellent water resistance and moisture resistance. Effects of complexity and continuous stable power generation

Pending Publication Date: 2021-04-16
CNBM HEFEI NEW ENERGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, most of the anti-reflection coating solutions on the market are silica prepared by the gel sol method as the main component, and the light transmittance of photovoltaic glass is improved through a loose and porous film layer structure. However, the open-pore structure on the surface of the film layer Pollutants or water vapor in the environment can easily enter the interior of the film or adhere to the surface of the film, which is difficult to remove; in addition, the surface of the anti-reflection film prepared based on the above method contains a large number of active groups, making the oily in the air Pollutants such as smog and dust are easy to adhere to the surface of photovoltaic glass, and the dirty layer formed on the surface of the film layer has a great impact on the penetration of sunlight, which reduces the conversion efficiency of solar photovoltaic cells and increases the cost of operation and maintenance.

Method used

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  • Antireflection film layer for photovoltaic glass, preparation method of antireflection film layer and solar cell module

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] An antireflection film layer for photovoltaic glass, comprising a main antireflection layer arranged on a glass substrate, and an auxiliary antireflection layer arranged on the main antireflection layer;

[0050] Wherein, the anti-reflection main layer includes the following parts by weight as raw material components: 25 parts of nano-silica dispersion (average particle size is 10nm), hollow silica particles (purchased from Nikke Catalyst Chemical Co., Ltd. company, the average particle size is 50nm, and the mass fraction is 22 parts of methyl ethyl ketone silica sol) 22 parts, polymethyl methacrylate 1.5 parts, ethanol 90 parts.

[0051] The auxiliary anti-reflection layer includes the following parts by weight as raw material components: 30 parts of perfluorohexyl ethyl acrylate, 5 parts of isocyanate curing agent, 0.8 parts of nano-alumina (average particle size: 100 nm), acetic acid 40 parts of ethyl ester.

[0052] The preparation method of the above-mentioned ant...

Embodiment 2

[0056] An antireflection film layer for photovoltaic glass, comprising a main antireflection layer arranged on a glass substrate, and an auxiliary antireflection layer arranged on the main antireflection layer;

[0057] Wherein, the anti-reflection main layer includes the following parts by weight as raw material components: 30 parts of nano-silica dispersion (average particle size is 10nm), hollow silica particles (purchased from Nikke Catalyst Chemical Co., Ltd. company, the average particle size is 50nm, the mass fraction is 20% methyl ethyl ketone silica sol) 15 parts, polymethyl methacrylate 2.5 parts, ethanol 100 parts.

[0058] The auxiliary anti-reflection layer includes the following parts by weight as raw material components: 35 parts of perfluorohexyl ethyl acrylate, 6 parts of isocyanate curing agent, 0.7 parts of nano-alumina (average particle size: 100 nm), acetic acid 40 parts of ethyl ester.

[0059] The preparation method of the above-mentioned anti-reflectio...

Embodiment 3

[0063] An antireflection film layer for photovoltaic glass, comprising a main antireflection layer arranged on a glass substrate, and an auxiliary antireflection layer arranged on the main antireflection layer;

[0064] Wherein, the anti-reflection main layer includes the following parts by weight as raw material components: 15 parts of nano-silica dispersion (average particle size is 10nm), hollow silica particles (purchased from Nikke Catalyst Chemical Co., Ltd. company, the average particle size is 50nm, the mass fraction is 20% methyl ethyl ketone silica sol) 30 parts, polymethyl methacrylate 0.5 part, ethanol 85 parts.

[0065] The anti-reflection auxiliary layer comprises the following parts by weight as raw material components: 20 parts of perfluorohexyl ethyl acrylate, 3 parts of isocyanate curing agent, 1 part of nano-alumina (average particle size: 100 nm), acetic acid 50 parts of ethyl ester.

[0066] The preparation method of the above-mentioned anti-reflection fi...

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Abstract

The invention relates to the technical field of photovoltaic glass, in particular to an antireflection film layer for photovoltaic glass, a preparation method of the antireflection film layer and a solar cell module, and the antireflection film layer comprises an antireflection main layer arranged on a glass substrate and an antireflection auxiliary layer arranged on the antireflection main layer; the antireflection main layer comprises nano silicon dioxide dispersoid, hollow silicon dioxide particles, a pore-forming agent and a solvent; the antireflection auxiliary layer comprises fluorine-containing resin, a curing agent, nanoscale inorganic particles and an organic solvent; according to the invention, the antireflection auxiliary layer contains resin with a fluorine-containing structure, and due to the existence of fluorine atoms, the surface of the antireflection film layer has excellent water resistance and moisture resistance, so that pollutants or greasy dirt and the like in the environment are prevented from entering the antireflection film layer or directly adhering to the surface of the film layer due to an open pore type structure on the surface in a traditional antireflection film layer system with a single-layer structure, and the solar ray transmittance is not reduced.

Description

technical field [0001] The invention relates to the technical field of photovoltaic glass, in particular to an anti-reflection film layer for photovoltaic glass, a preparation method thereof, and a solar cell module. Background technique [0002] The packaging structure of commercial solar cell modules is composed of photovoltaic glass, adhesive film, battery sheet and back film. Due to the interface between the photovoltaic packaging glass and the air, it will bring about 4% sunlight reflection. Unable to participate in the photoelectric conversion process, resulting in a certain loss of light. The anti-reflection coating can effectively suppress the light reflection loss caused by the difference in refractive index at the interface. Therefore, it is generally required to coat the surface of photovoltaic glass with an anti-reflection coating in photovoltaic modules, which has important practical significance and huge economic value. However, , due to the broad-spectrum cha...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34H01L31/0216H01L31/048
CPCY02E10/50
Inventor 王怡馨夏善慧王伟陈汉舟
Owner CNBM HEFEI NEW ENERGY CO LTD
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