Epitaxial integrated dielectric film distributed bragg reflector (DBR) external cavity surface emitting laser

A technology of emitting lasers and integrated media, applied in lasers, laser parts, semiconductor lasers, etc., can solve the problems of unstable polarization, short photon life, hindering applications, etc., achieve stable polarization voltage, narrow line width, and increase high reflection characteristics , Increase the effect of the original cavity length

Inactive Publication Date: 2021-05-25
BEIJING UNIV OF TECH
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

Ordinary oxidized vertical cavity surface emitting lasers, due to the anisotropy of the material of the oxidation confinement layer and the anisotropy of the gain of the material in the active region, lead to uncertain or unstable polarization of the laser, and, due to the The change of the temperature of the source region may also cause polarization instability; secondly, in the oxidation-limited vertical strong surface emitting laser, due to the short photon lifetime, it is very difficult to narrow the spectral linewidth to less than 100MHz, usually at several Hundreds of MHz range
The above characteristics seriously affect the light quality of vertical cavity surface emitting lasers, and hinder the application of vertical cavity surface emitting lasers in high-precision systems such as atomic microsystems.

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  • Epitaxial integrated dielectric film distributed bragg reflector (DBR) external cavity surface emitting laser
  • Epitaxial integrated dielectric film distributed bragg reflector (DBR) external cavity surface emitting laser

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Embodiment Construction

[0014] Such as figure 1 , 2 As shown, the 850nm epitaxial wafer is grown by MOCVD, silicon oxide is deposited by ICPCVD, the mesa pattern is etched by photolithography, the mesa is etched by ICP, and the oxidation limiting layer (4) with high aluminum composition is exposed, and the current limiting layer is formed by wet oxidation. Oxidation holes (9), use ICPCVD to grow passivation layer (2), etch light exit holes (13) by photolithography, make P-type electrodes (1) by thermal evaporation and stripping, and make N-type electrodes by magnetron sputtering ( 8), to obtain a common oxide vertical cavity surface emitting laser (attached figure 1 ); by inductively coupled plasma-enhanced chemical vapor deposition and stripping, the dielectric layer is deposited to a common vertical cavity surface emitting laser device to form a phase matching layer (10), a cavity length matching layer (11) and a dielectric film distributed Bragg reflection mirror (12), to obtain an epitaxially i...

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Abstract

The invention discloses an epitaxial integrated dielectric film DBR external cavity surface emitting laser. The laser comprises a P-type metal electrode layer, a passivation layer, an upper distributed Bragg reflector growing periodically and alternately, an oxidation limiting layer with a high aluminum component, an active region, a lower distributed Bragg reflector growing periodically, a GaAs substrate layer, an N-type metal electrode layer, a current limiting oxidation hole, a phase matching layer, a cavity length matching layer, a silicon oxide and silicon nitride dielectric film distributed Bragg reflector and a light emitting hole; and the inherent cavity length of the vertical cavity surface emitting laser is prolonged by adopting a method of growing a phase matching layer and a cavity length matching layer, and the silicon oxide silicon nitride dielectric film distributed Bragg reflector is extended by adopting an inductively coupled plasma enhanced vapor deposition method, so that the purposes of controlling light polarization and narrowing line width are achieved. The threshold value of the semiconductor laser is reduced, and the yield of the device is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor lasers, in particular to an epitaxial integrated dielectric film DBR external cavity surface emitting laser. Background technique [0002] Vertical cavity surface emitting laser (VCSEL) is widely used in optical communication, laser radar, integrated chip system and other fields due to its miniaturization, low power loss, fast modulation response, continuous beam output and other characteristics. Ordinary oxidized vertical cavity surface emitting lasers, due to the anisotropy of the material of the oxidation confinement layer and the anisotropy of the gain of the material in the active region, lead to uncertain or unstable polarization of the laser, and, due to the The change of the temperature of the source region may also cause polarization instability; secondly, in the oxidation-limited vertical strong surface emitting laser, due to the short photon lifetime, it is very difficult to narro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/14H01S5/187
CPCH01S5/14H01S5/187H01S5/1028
Inventor 徐晨吴博解意洋傅攀赵旭鹏
Owner BEIJING UNIV OF TECH
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