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Diffuse reflection type calibration plate and preparation method thereof

A diffuse reflection and calibration plate technology, which is applied in the field of calibration plates, can solve problems such as not suitable for processing thin glass, weather resistance, high temperature, glass surface damage, etc., and achieve good uniformity of frosting effect, high difficulty and high development cost. Effect

Pending Publication Date: 2021-10-29
CHANGSHA SHAOGUANG CHROME BLANK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the adhesion of the polymer film coated on the glass surface is worse than that of the chromium film deposited by magnetron sputtering, and it is not resistant to weather, high temperature, acid and alkali, etc.
[0006] At present, there is no technology to treat the surface of the glass material calibration plate to solve the problem of reflection. During the operation, it is found that the sandblasting effect will cause damage to the glass surface, and it is not suitable for processing thin glass

Method used

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  • Diffuse reflection type calibration plate and preparation method thereof
  • Diffuse reflection type calibration plate and preparation method thereof
  • Diffuse reflection type calibration plate and preparation method thereof

Examples

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Effect test

Embodiment 1

[0044] For calibration plates that do not require flatness, polishing sheets / original glass can be used to directly grind. This embodiment is a method for preparing a diffuse reflection calibration plate with double-sided frosting, including the following steps:

[0045] The first grinding: use 20% DN95 emery solution with a particle size of 10 microns or less, apply a pressure of 100kgf during grinding, and grind the upper and lower surfaces of the polishing sheet / original glass for 10 minutes respectively, and the surface roughness of the first grinding surface is Ra is 5 microns, and the surface particle size is 8 microns.

[0046] Making graphics: on the first grinding surface of the upper surface of the polished sheet / original glass, the semiconductor mask plate graphics production process is used to process and produce graphics, followed by coating, gluing, photolithography, development and corrosion to obtain metal chromium layer graphics;

[0047] The coating process i...

Embodiment 2

[0054] For calibration plates that do not require flatness, polishing sheets / original glass can be used to directly grind. This embodiment is a method for preparing a diffuse reflection calibration plate with double-sided frosting, including the following steps:

[0055] The first grinding: use 20% DN95 emery solution with a particle size of 10 microns or less, apply a pressure of 100kgf during grinding, grind the upper surface of the polishing sheet / original glass for 10 minutes, and the surface roughness Ra of the first grinding surface is 5 microns, And the surface particle size is 8 microns.

[0056] Making graphics: on the first grinding surface of the upper surface of the polished sheet / original glass, the semiconductor mask plate graphics production process is used to process and produce graphics, followed by coating, gluing, photolithography, development and corrosion to obtain metal chromium layer graphics ;

[0057] The coating process is to put the polished sheet / o...

Embodiment 3

[0065] For the calibration plate with a flatness requirement of 10 microns to 30 microns, use a polishing sheet / original glass to grind and then polish on one side. This embodiment is a method for preparing a diffuse reflection calibration plate with one side frosted, including the following steps:

[0066] The first grinding: use 20% DN95 emery solution with a particle size of 10 microns or less, apply a pressure of 100kgf during grinding, and grind the upper and lower surfaces of the polishing sheet / original glass for 10 minutes respectively, and the surface roughness of the first grinding surface is Ra is 5 microns, and the surface particle size is 8 microns.

[0067] Polishing step: use 10% DN95 cerium oxide polishing solution with a particle size of 0.5 microns, and polish the first grinding surface of the lower surface of the polishing sheet / original glass for 10 minutes to obtain a polished surface; the surface roughness Ra of the polished surface is 0.015nm . The poli...

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Abstract

The invention discloses a preparation method of a diffuse reflection type calibration plate. The preparation method comprises the following steps of: grinding the upper surface and / or the lower surface of polished wafer / original glass for 10-40 minutes by using a 20-60% DN95 carborundum solution with the particle size of 10 microns or below to obtain a first grinding surface, wherein the upper surface of the polished wafer / original glass is the first grinding surface or a plane; processing and manufacturing a pattern on the upper surface of the polished wafer / original glass by adopting a semiconductor mask pattern manufacturing process flow, and sequentially carrying out film coating, gluing, photoetching, developing and corroding to obtain a metal chromium layer; and carrying out precise cutting, wherein the dimensional precision is + / -0.05mm. The invention further discloses a calibration plate prepared by using the method. According to the method, the grinding effect is achieved by adopting a grinding process, the requirement for high flatness is met, sand grains are fine and controllable, and the reflectivity is smaller than 0.1%.

Description

technical field [0001] The invention relates to the field of calibration plates, in particular to a diffuse reflection calibration plate and a preparation method thereof. Background technique [0002] In applications such as machine vision, image measurement, photogrammetry, and three-dimensional reconstruction, in order to correct lens distortion, determine the conversion relationship between physical size and pixel, and determine the relationship between the three-dimensional geometric position of a point on the surface of a space object and its corresponding point in the image It is necessary to establish a geometric model of camera imaging. The geometric model of the camera can be obtained by shooting the flat plate with a fixed-pitch pattern array by the camera and calculating the calibration algorithm, so as to obtain high-precision measurement and reconstruction results. However, in the case of front light, the glass material calibration plate will reflect light. ...

Claims

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Application Information

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IPC IPC(8): B24B1/00G03F7/00
CPCB24B1/00G03F7/00
Inventor 邓辉陈保国范海文
Owner CHANGSHA SHAOGUANG CHROME BLANK
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