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Core-shell-structured cerium dioxide/nano-diamond composite abrasive material, preparation method thereof, and polishing solution for ultra-precision polishing of sapphire

A technology of nano-diamond and ceria, which is applied in the field of polishing liquid for ultra-precision polishing of sapphire, can solve the problems of sapphire wafer scratches, low polishing efficiency, and reduce the surface roughness of sapphire, achieve dispersion without delamination, and improve polishing efficiency , the effect of small roughness

Active Publication Date: 2021-10-29
ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The object of the present invention is to propose a ceria / nano-diamond composite abrasive with a core-shell structure for the problems of low polishing efficiency and easy scratches on the sapphire wafer due to the existence of different degrees of traditional polishing fluids. The abrasive is a core-shell structure , diamond particles are grown on ceria nanorods, this new composite abrasive can not only prevent diamond from scratching sapphire, significantly reduce the surface roughness of sapphire, but also effectively improve polishing efficiency

Method used

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  • Core-shell-structured cerium dioxide/nano-diamond composite abrasive material, preparation method thereof, and polishing solution for ultra-precision polishing of sapphire
  • Core-shell-structured cerium dioxide/nano-diamond composite abrasive material, preparation method thereof, and polishing solution for ultra-precision polishing of sapphire
  • Core-shell-structured cerium dioxide/nano-diamond composite abrasive material, preparation method thereof, and polishing solution for ultra-precision polishing of sapphire

Examples

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Embodiment 1

[0037] The present embodiment provides a kind of polishing solution for sapphire ultra-precision polishing, in parts by weight, comprising:

[0038] Cerium oxide / nano-diamond composite abrasive with a core-shell structure (the weight ratio of cerium oxide nanorods to nano-diamond particles=1:1): 0.5 parts;

[0039] Surfactant: 1 part of sorbitan monostearate;

[0040] Polyoxyethylene ether compound: 1 part of fatty alcohol polyoxyethylene ether;

[0041] Polyol compound: 0.1 part of diglycerin;

[0042] Polywax compound: 1 part of polyoxyethylene wax;

[0043] 3# white oil: 96.4 parts.

[0044] The ceria / nanodiamond composite abrasive with a core-shell structure is ceria nanorods grown with nanodiamond particles. The diameter of the ceria nanorod is 100-500nm, and the particle size (D50) of the nano-diamond particle is 50-300nm.

[0045]The preparation method of the ceria / nanodiamond abrasive of described core-shell structure comprises the following steps:

[0046] Step ...

Embodiment 2-13

[0054] The composition and weight ratio of the core-shell structure ceria / nanodiamond composite abrasive used in Examples 2-13 are shown in Table 1, and the preparation method is the same as that of Example 1. The components and parts by weight of the polishing liquid used in Examples 2-13 for ultra-precision polishing of sapphire are shown in Table 1, and the preparation method is the same as that of Example 1.

[0055] Table 1 Example 2-13

[0056]

[0057]

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Abstract

The invention provides a cerium dioxide / nano-diamond composite abrasive with a core-shell structure, a preparation method thereof, and a polishing solution for ultra-precision polishing of sapphire. The cerium dioxide / nano-diamond composite abrasive material with the core-shell structure is a cerium dioxide nano-rod on which nano-diamond particles grow, and the novel composite abrasive material not only can prevent diamond from scratching sapphire and remarkably reduce the surface roughness of the sapphire, but also can effectively improve the polishing efficiency. The invention also discloses the polishing solution for ultra-precision polishing of sapphire. The cerium dioxide / nano-diamond abrasive in the polishing solution is uniformly dispersed, is not easy to agglomerate, is easier to form a stable turbid liquid system, and is uniformly dispersed and not layered for a long time.

Description

technical field [0001] The invention relates to diamond polishing fluid technology, in particular to a core-shell structure ceria / nano-diamond composite abrasive, a preparation method thereof and a polishing fluid for ultra-precision polishing of sapphire. Background technique [0002] With the development of the LED industry, the chip substrate is gradually developing in the direction of large size and high quality. Among them, sapphire wafer is the preferred substrate in the current LED industry. Sapphire is a general term for alumina single crystal materials. It has excellent chemical stability, optical transparency and ideal mechanical properties. It is often used as a material for optoelectronic components, such as Optical transmission windows, light-emitting diodes, substrates for microelectronic integrated circuit applications, and substrates for gallium nitride growth, etc. As the processing of electronic devices has gradually reached the nanometer or even sub-nanom...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14C09G1/02B24B57/02B24B1/00
CPCC09K3/1436C09G1/02B24B1/00B24B57/02
Inventor 侯军丁静
Owner ZHEJIANG AUFIRST MATERIAL TECH CO LTD
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