395results about How to "Easy to scratch" patented technology

To improve the reliability and yield of a thin-type semiconductor device as used for a stack-type flash memory, the semiconductor device is manufactured by upheaving each of semiconductor chips (semiconductor devices) obtained by dicing a semiconductor wafer on an adhesive sheet from a backside via the adhesive sheet using an upthrow jig to which ultrasonic vibration is applied so as not to break through the adhesive sheet, and by picking up each semiconductor chip.

The invention provides a high-scratch-resistance abrasion-resistant coating material and a preparation method thereof. The preparation method comprises the following steps: modifying the graphene surface by using active groups by a chemical modification technique to obtain modified graphene, and blending the modified graphene with polysiloxane to obtain the high-scratch-resistance abrasion-resistant nano composite coating material. The surface modification is carried out to enhance the dispersity of the graphene and the interactions between the graphene and polysiloxane matrix, thereby enhancing the mechanical properties of the coating. No pigment or filler is added. The scratch resistance of the transparent graphene/polysiloxane composite coating is enhanced by 140% or above, and the abrasion loss is reduced by 60% or above. The transparent graphene/polysiloxane composite coating has excellent adhesion, heat resistance, weather resistance, flame retardancy and corrosion resistance. The graphene/polysiloxane composite coating can be used for surface protection and shielding of various metals, plastics, wood, concrete, glass and other substrates, and is applicable to the fields of automobile paints, photoelectric materials, precision instruments, marine heavy-corrosion protection, buildings and the like.

A personal safety protective device that includes a lens and a support structure onto which the lens is secured. The lens includes a substrate and a hard-coat layer located on the substrate of the lens. The hard-coat layer has a low surface energy outer surface that is derived from a) an additive that includes at least one of i) a perfluoropolyether urethane that includes hydrolysable silane groups, and ii) an acrylate polymer that includes at least one perfluoropolyether moiety and at least one hydrolysable silane group, and b) a silsesquioxane-based hard-coat composition. The provision of such a lens on a personal safety protective device enables the lens to be durable to abrasion and to be easily cleaned without use of solvents that could shorten the service life of the lens.

The present invention relates to a method for preparing cerium oxide coated silica particles and cerium oxide silica particles obtainable by the method. The invention further relates to cerium oxide coated silica particles and the use thereof for polishing.

The invention relates to a slight center wave strip-shape control method of hot-rolled strip steel. The method comprises the following steps: firstly, choosing a strip-shape feedback control frame; utilizing the adjusting manner of upstream frames, namely, adjusting the roll bending forces of the frames F2-F4 to realize the targeted slight center waves at a precision rolled outlet; secondly, controlling and adjusting the roll bending forces; detecting the flatness of the strip steel in real time by a strip-shape instrument and comparing it with a target value; if the deviation exists, adjusting the roll bending forces of the frames F2-F4. The slight center wave strip-shape control method of hot-rolled strip steel is applicable to overcoming strip-shape problems caused by the stages such as cooling and thermal treatment after hot rolling; the strip-shape quality of martensitic stainless steel strips is improved greatly and the scratching on the surface strip-shape in follow-up pickling and continuous annealing production is solved.

The invention provides a method for activating and adjusting mineralized bubbles in the vulcanizing flotation process of copper oxide ores. The method comprises pre-stage flotation, post-stage flotation and selection; after grinding and mixing, a vulcanizing agent, a collecting agent and a foaming agent are added in each sub-stage of the pre-stage flotation; the mineralized bubble adjusting agent I, a vulcanizing agent, an activating agent, a collecting agent and a foaming agent are added in each sub-stage of the post-stage flotation; and the mineralized bubble adjusting agent II, a vulcanizing agent and a collecting agent are added in each sub-stage of the selection so as to obtain copper concentrate and tailings. The method provided by the invention has the advantages that: the mineralized bubble adjusting agent is correspondingly added when the activating agent is added in the post-stage flotation so as to avoid excessively large bubbles caused by adding the activating agent only, and the production operation is convenient; and compared with the conventional vulcanizing flotation method and conventional activating flotation method, by adopting the medicine adding method and flow structure provided by the invention, the method can improve the recovery rate of copper concentrate by 8-14% while ensuring similar grades of the copper concentrate.

A glass material for mold pressing, comprising a core portion comprised of an optical glass with a degree of abrasion FA of 200 or higher and a covering portion comprised of a second glass covering at least a portion of the surface of said core portion. A method for manufacturing an optical glass element, wherein a glass material that has been preformed to a prescribed shape is heat softened and press molded with a pressing mold and the outer perimeter portion of the molded product obtained is removed by mechanical processing. The above-mentioned glass material for mold pressing is used as the glass material. To provide a means whereby an optical element does not bear scratches on optically functional surfaces through contact during handling after the press molding of press molded glass products despite being comprised of a glass material with a high degree of abrasion, and a means whereby even when scratched, the function of the optical element finally obtained is unaffected.

A polishing pad capable of maintaining a high level of dimensional stability upon moisture absorption or water absorption and providing high polishing rate includes a polishing layer of a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol, (2) an isocyanate-terminated prepolymer (B) that includes a polymerized diisocyanate and a polyethylene glycol with a number average molecular weight of 200 to 1,000, and (3) a chain extender.

The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films.

The invention discloses a preparation method for high-hardness waterborne polyurethane dispersion. An inorganic nano material and waterborne polyurethane are grafted through an in-situ polymerization method, so that the hybridization reaction of inorganic materials and the organic materials is realized and complementary advantages are realized. The preparation method comprises the following operation steps: adding polyisocyanate, macromolecule polyol, a catalyst, a chain extender and a silane coupling agent according to certain weight ratio in a flask for reacting to obtain a polyurethane prepolymer; after the reaction is ended, sequentially adding a neutralizer, inorganic nano material dispersion liquid and deionized water under the condition of low-temperature and high-speed stirring; finally, heating under the vacuum condition for removing the solvent to obtain the high-hardness waterborne polyurethane dispersion. Compared with the traditional inorganic and organic blending process, the preparation method has the characteristics that products prepared through the preparation method have the advantages of good stability, excellent water resistance, long-time aging resistance, excellent and high adhesion, high drying speed, high hardness, good fullness, higher light transmittance and the like, and are wide in application range.

A device stores, mixes, and applies polymethylmethacrylate bone cement. The device comprises a first container for a first pasty component of the bone cement, a dispensing plunger arranged in the first container such that it can be shifted and serves for pressing the content of the first container out of a dispensing opening, a mixing facility for mixing the content of the first container, whereby the mixing facility is arranged in the first container and the mixing facility can be moved in the first container from outside for mixing, and at least one second container for at least one second component of the bone cement is arranged in or on said first container. The second container can be opened, such that the contents of the first container and second container can be mixed with each other in the first container, whereby at least a boundary surface of the first container is formed by a mobile volume compensation element.

The nozzle (100) has a base plate (10) cleaning a floor with airflow-pressure and connected to a connecting rod (20). A limiting unit i.e. stop (14), limits rotation of the base plate to rotation angle (alpha1) with respect to the connecting rod, where the angle is a function of value of the airflow-pressure and proportional to the airflow-pressure. The stop unit is arranged on the connecting rod and on the base plate. The stop includes a cylindrical part fitted on the connecting rod and on the base plate, where the part possesses length representing a value of the angle.

The invention relates to a manufacture method of a touch plane display panel, which comprises the steps of: providing a base plate provided with an outer surface and an inner surface relative to the outer surface; forming a plurality of bridge wires and a plurality of color filter films arranged in arrays on the outer surface, wherein the color filter films are provided with a plurality of touch openings; partial regions of each bridge wire are respectively exposed by two touch openings; forming a sensing line layer on the color filter films, wherein partial sensing line layers are electrically connected with the bridge wires through the touch openings; and assembling a liquid crystal layer between the inner surface of the base plate and an array base plate. At the same time, the invention discloses a touch plate display panel.

The invention concerns a process for generating a feed-through in a semiconductor wafer, which has electric circuitry embedded in a front surface whereby the hole for the feed-through is generated by the combined use of a front side protection layer and a wet KOH etch process etching the hole from the back side of the wafer, where a photomasking process is subsequently used do define the via followed by deposition of the via material.

The invention discloses an epoxy floor coating containing epoxy polyether organosilicon hybrid and a preparation method thereof, belonging to the field of building materials. According to the method, the epoxy polyether organosilicon hybrid is prepared through hydrolytic polycondensation, and then 100 parts of an epoxy resin, 10 to 80 parts of a curing agent, 1 part to 80 parts of the epoxy polyether organosilicon hybrid, 0.1 part to 3 parts of an antifoaming agent, 0 to 20 parts of an active diluent, 0.5 part to 2 parts of a leveling agent, 0.05 part to 10 parts of a dispersant, 0 to 40 parts of an organic solvent, 2 to 16 parts of pigments, 20 to 150 parts of a filling material and 0 to 5 parts of a promoter are uniformly mixed so as to obtain the epoxy floor coating. Through modification by the epoxy polyether organosilicon hybrid, the epoxy floor coating provided in the invention has the following advantages compared to conventional epoxy floor coatings: a floor coated by the epoxy floor coating has a high hardness and good wear resistance, stain resistance and heat resistance; the preparation method has the advantages of a simple preparation process, easily available raw materials and convenient implementation, which enables production cost to be reduced and strong practicality to be obtained.

The invention relates to an optical engine which comprises a cylinder cover, an original cylinder casing and a piston; a transparent quartz glass cylinder casing is arranged between the cylinder cover and the original cylinder casing; the piston is an extended piston; the top of the extended piston is provided with a round window; transparent quartz glass is arranged in the round window; the length of the transparent quartz glass cylinder casing is more than the sum of the stroke of the engine and the distance between a ring at the bottommost of the piston and the top surface of the piston; and an engine cylinder body, the original cylinder casing, the cylinder cover and the transparent quartz glass cylinder casing are fixedly connected by bolts.

To provide a slurry for Chemical Mechanical Polishing, a Chemical Mechanical Polishing method using said slurry, and a method of producing electronic devices using said method that makes it possible to achieve a low scratch process capability in processing surfaces such as SiO₂ film surfaces and the like and also to enable speed polishing to attain a high processing efficiency.

Slurry for Chemical Mechanical Polishing characterized in comprising abrasive grains and water, wherein said abrasive grains are composite particles coated with ceria particles consisting of organic host particles and ceria particles, zeta potential of said composite particles being a negative potential, the organic host particles constituting the composite particles coated with ceria particles are organic host particles to which carboxyl groups and sulfonyl groups are introduced; the slurry is added with panarization additive; and the planarization additive is poly(methyl)acrylic acid ammonium salt.

An exemplary liquid crystal display module includes a liquid crystal display panel, a backlight unit, a bottom frame, and an upper frame. The backlight unit is positioned on the bottom frame. The upper frame is assembled on the bottom frame to fix the backlight unit in position. The upper frame includes four sidewalls, a top flange extending from the four sidewalls towards a center of the upper frame, and a plurality of supporting members defined at the inner surfaces of the sidewalls adjacent to the top flange. At least one of the supporting members is resilient. The liquid crystal display panel is held in place between the top flange and the supporting members. A method for assembling the liquid crystal display module is also provided.