Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and system for closed-loop regeneration of acidic etching liquid

A technology of acid etching solution and acid etching waste solution, which is applied to the improvement of process efficiency, photography process, diaphragm, etc., can solve the problems of waste of copper resources, large acid consumption, environmental pollution, etc., and achieve cost savings, exemption from processing costs, The effect of clear flow

Pending Publication Date: 2021-11-19
深圳市祺鑫环保科技有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Aiming at problems such as large acid consumption, waste of copper resources, and environmental pollution in the regeneration method of acidic etching waste existing in the prior art, the present invention focuses on suppressing the precipitation of chlorine gas, and proposes a method for closed-loop regeneration of acidic etching liquid. In addition to the anolyte sulfuric acid, there is no need to add additional acid and oxidant, and the etching solution is regenerated while recovering the cathode copper. The resulting regeneration solution can be directly used in the etching line without generating a large amount of additional waste water

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and system for closed-loop regeneration of acidic etching liquid
  • Method and system for closed-loop regeneration of acidic etching liquid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] This embodiment provides a system device for closed-loop regeneration of acidic etching solution, such as figure 1 As shown, the system device for the closed-loop regeneration of the acidic etching solution includes a three-chamber electrolysis device 3, which includes a first anode chamber 5, a cathode chamber 6 and a second anode chamber 8, and the first anode chamber 5 It is separated from the cathode chamber 6 by a cation exchange membrane 7, and Cu is set in the cathode chamber 6 + and Cu 2+ Concentration detection device 9, oxidation-reduction potential detection device 10 is set in the second anode chamber 8, the first anode chamber 5 includes a first anode plate 14 coated with titanium iridium and tantalum, and the second anode chamber 8 includes a stainless steel second anode plate 16 , the cathode chamber 6 includes a titanium cathode plate 15 .

[0084] The system device also includes an etching line 1, which is connected to the three-chamber electrolysis d...

Embodiment 2

[0092] This embodiment provides a system device for closed-loop regeneration of acidic etching solution, such as figure 2 As shown, the system device for the closed-loop regeneration of the acidic etching solution includes a three-chamber electrolysis device 3, which includes a first anode chamber 5, a cathode chamber 6 and a second anode chamber 8, and the first anode chamber 5 It is separated from the cathode chamber 6 by a cation exchange membrane 7, and Cu is set in the cathode chamber 6 + And concentration detection device 9, redox potential detection device 10 is set in the second anode chamber 8, comprises the first anode plate 14 of titanium coating iridium tantalum in the first anode chamber 5, comprises the second anode plate of graphite in the second anode chamber 8 16. The cathode chamber 6 includes a titanium cathode plate 15.

[0093] The system device also includes an etching line 1, which is connected to the three-chamber electrolysis device 3 according to th...

Embodiment 3

[0101] This embodiment provides a system device for closed-loop regeneration of acidic etching solution, such as figure 1 As shown, the system device for the closed-loop regeneration of the acidic etching solution includes a three-chamber electrolysis device 3, which includes a first anode chamber 5, a cathode chamber 6 and a second anode chamber 8, and the first anode chamber 5 It is separated from the cathode chamber 6 by a cation exchange membrane 7, and Cu is set in the cathode chamber 6 + and Cu 2+ Concentration detection device 9, oxidation-reduction potential detection device 10 is set in the second anode chamber 8, the first anode chamber 5 includes a first anode plate 14 coated with titanium iridium and tantalum, and the second anode chamber 8 includes a stainless steel second anode plate 16 , the cathode chamber 6 includes a titanium cathode plate 15 .

[0102] The system device also includes an etching line 1, which is connected to the three-chamber electrolysis d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method and a system for closed-loop regeneration of an acidic etching liquid. The method is characterized in that an acidic etching waste liquid after electrolysis in a cathode chamber in a three-chamber electrolysis device is transferred to a second anode chamber for three-chamber electrolysis, so that copper can be recovered while the acidic etching waste liquid is regenerated, and chlorine is prevented from being generated. According to the system device, a cation exchange membrane is arranged between a first anode chamber and a cathode chamber, a cation concentration detection device is arranged in the cathode chamber, an oxidation-reduction parameter detection device is arranged in a second anode chamber, so that the combined use of the detection device and an automatic control system is realized, automatic production can be realized, the method is suitable for regeneration of waste liquid containing various metal cations and is wide in application range.

Description

technical field [0001] The invention belongs to the technical field of wastewater treatment, in particular to a method and system for closed-loop regeneration of acid etching solution. Background technique [0002] As the demand for electronic products continues to grow, the semiconductor industry is developing rapidly. As an indispensable part of electronic products, printed circuit boards are the carrier of various components. Due to people's demand for miniaturization and light weight of intelligent equipment, printed circuit boards are developing in the direction of high precision and high density. The etching process is the most important link in the printed circuit board. The most widely used etching solution in the etching process is acidic copper chloride etching solution. The acidic copper chloride etching solution has a fast etching rate (up to 70 μm / min or more), The advantages of high copper dissolving ability, small side etching, and easy etching control. [0...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C7/06C25C7/00C25C7/04C25C1/12C23F1/18
CPCC23F1/46C25C7/06C25C7/00C25C7/04C25C1/12C23F1/18Y02P10/20
Inventor 张伟奇李再强黄文涛梁民
Owner 深圳市祺鑫环保科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com