Preparation method and application of self-assembled conjugated polymer film
A conjugated polymer and self-assembly technology, used in semiconductor/solid-state device manufacturing, photovoltaic power generation, electrical components, etc., can solve the problems of amorphous structure, difficult separation of thin films, and difficult film formation, and achieve good interface optimization and improvement. Photoelectric properties, mild reaction conditions
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0041] A method for preparing a self-assembled conjugated polymer film, carried out according to the following steps:
[0042] 1) Cleaning treatment of beakers, sample bottles and silicon wafer substrates: the cleaning treatment of beakers, sample bottles and silicon wafer substrates is to ultrasonicate them in deionized water, ethanol, acetone and deionized water respectively for 15-20min, Dry it with high-purity nitrogen, and finally put the silicon wafer substrate into an oxygen plasma cleaning machine for 5 minutes.
[0043] 2) Preparation of carbazole derivative solvent: carbazole derivative is added in suitable organic solvent, optional solvent has dichloro, methane, dichloroethane, trichloromethane, chlorobenzene, toluene, and solution concentration is 10mg / mL, mixed and added to a 10mL sample bottle, put into a magnet and stirred thoroughly.
[0044] 3) Preparation of conjugated polymer films at the gas-liquid interface: Pour a poor solvent into a clean beaker, and th...
Embodiment 2
[0048] A preparation method of adjustable thickness, transferable, light-induced self-assembled conjugated polymer film is carried out according to the following steps:
[0049] 1) Cleaning treatment of beakers, sample bottles and silicon wafer substrates: the cleaning treatment of beakers, sample bottles and silicon wafer substrates is to ultrasonicate them in deionized water, ethanol, acetone and deionized water for 20 minutes respectively, and use high Blow dry with pure nitrogen, and finally place the silicon wafer substrate in an oxygen plasma cleaning machine for 15 minutes.
[0050] 2) Preparation of carbazole derivative solvent: carbazole derivative is added in suitable organic solvent, optional solvent has dichloro, methane, dichloroethane, trichloromethane, chlorobenzene, toluene, and solution concentration is 20mg / mL, mixed and added to a 10mL sample bottle, put into a magnet and stirred thoroughly.
[0051] 3) Preparation of conjugated polymer films at the gas-liq...
Embodiment 3
[0056] A method for preparing a volatile memristor using a light-induced self-assembled conjugated polymer film, the steps are as follows:
[0057] 1) Cleaning treatment of beakers, sample bottles and silicon wafer substrates: the cleaning treatment of beakers, sample bottles and silicon wafer substrates is to ultrasonicate them in deionized water, ethanol, acetone and deionized water for 30 minutes respectively, and use high Blow dry with pure nitrogen. Finally, put the silicon wafer substrate into an oxygen plasma cleaner for 10 min.
[0058] 2) Preparation of carbazole derivative solvent: carbazole derivative is added in suitable organic solvent, optional solvent has dichloro, methane, dichloroethane, trichloromethane, chlorobenzene, toluene, and solution concentration is 15mg / mL, mixed and added to a 10mL sample bottle, put into a magnet and stirred thoroughly.
[0059] 3) Preparation of conjugated polymer films at the gas-liquid interface: Pour a poor solvent into a cle...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Thickness | aaaaa | aaaaa |
| Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


