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A low-temperature-resistant pvdf film for photovoltaic backplane and preparation method thereof

A photovoltaic backplane and low-temperature technology, applied in the field of PVDF film, can solve the problems of low mechanical properties and achieve excellent mechanical properties, high practicability, and good barrier effect

Active Publication Date: 2022-04-26
嘉兴高正新材料科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the technical deficiency of the low mechanical properties of the existing PVDF film on the basis of ensuring the weather resistance and barrier property of the PVDF film. The preparation method is simple and easy, and the existing equipment can be produced. The PVDF film prepared by the preparation method has excellent mechanical properties at low temperature, specifically, it is maintained at a low temperature of -40°C for 60 minutes, and the mechanical properties are excellent, and the transverse elongation at break is 50-70%, and it is better at the same time. To simulate the extreme weather with large temperature difference between day and night, the PVDF film prepared by the present invention also passed the test of high temperature baking (145°C, 30min) and then low temperature (-40°C, 60min), the mechanical properties were also excellent, and the transverse fracture elongation The rate is 40-50%, and the low-temperature mechanical properties are better than ordinary PVDF membranes on the market

Method used

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  • A low-temperature-resistant pvdf film for photovoltaic backplane and preparation method thereof
  • A low-temperature-resistant pvdf film for photovoltaic backplane and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0032] A method for preparing a low-temperature-resistant PVDF film for a photovoltaic backplane, comprising the following steps:

[0033] (1) Take 1-ethynyl-1-cyclohexanol, triethylamine and dichloromethane, stir evenly, cool down to 0°C, slowly add acryloyl chloride, dropwise for 2h, stir at 25°C for 14h, heat up to 35°C, heat-retain for 3 hours, remove the solvent by rotary evaporation, wash with saturated brine, and dry to obtain the alkynylated acrylate monomer. The molar ratio of 1-ethynyl-1-cyclohexanol, triethylamine and acryloyl chloride is 4:5:4.25.

[0034]Take 1 / 2 amount of dodecylbenzenesulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, add organosilicon monomer, stir well to obtain solution A; take 1 / 2 amount of dodecane Base benzene sulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, slowly add solution A dropwise, react for 3 hours, and obtain a nuclear emulsion; the total amount of dodecylbenzene sulfonic acid is 2% of the mas...

Embodiment 2

[0042] A method for preparing a low-temperature-resistant PVDF film for a photovoltaic backplane, comprising the following steps:

[0043] (1) Take 1-ethynyl-1-cyclohexanol, triethylamine and dichloromethane, stir evenly, cool down to 0°C, slowly add acryloyl chloride, dropwise for 2h, stir at 28°C for 13h, heat up to 38°C, heat-retain for 2.5 hours, remove the solvent by rotary evaporation, wash with saturated brine, and dry to obtain the alkynylated acrylate monomer. The molar ratio of 1-ethynyl-1-cyclohexanol, triethylamine and acryloyl chloride is 4:5:4.25.

[0044] Take 1 / 2 amount of dodecylbenzenesulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, add organosilicon monomer, stir well to obtain solution A; take 1 / 2 amount of dodecane Base benzene sulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, slowly add solution A dropwise, react for 3.2h, and obtain nuclear emulsion; the total amount of dodecylbenzene sulfonic acid is 2% of the mass ...

Embodiment 3

[0052] A method for preparing a low-temperature-resistant PVDF film for a photovoltaic backplane, comprising the following steps:

[0053] (1) Take 1-ethynyl-1-cyclohexanol, triethylamine and dichloromethane, stir well, cool down to 0°C, slowly add acryloyl chloride, dropwise for 2h, stir at 30°C for 12h, heat up to 40°C, heat-retain for 2 hours, remove the solvent by rotary evaporation, wash with saturated brine, and dry to obtain the alkynylated acrylate monomer. The molar ratio of 1-ethynyl-1-cyclohexanol, triethylamine and acryloyl chloride is 4:5:4.25.

[0054] Take 1 / 2 amount of dodecylbenzenesulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, add organosilicon monomer, stir well to obtain solution A; take 1 / 2 amount of dodecane Base benzene sulfonic acid and 1 / 2 amount of OP-10, dissolve in deionized water, slowly add solution A dropwise, react for 3.5 hours, and obtain nuclear emulsion; the total amount of dodecylbenzene sulfonic acid is 2% of the mass...

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Abstract

The invention discloses a low-temperature-resistant PVDF film for photovoltaic backsheets and a preparation method thereof; the scheme is composed of PVDF, polymethyl methacrylate, magnetizing toughener, titanium dioxide, antioxidants, ultraviolet absorbers and other components Raw materials, the prepared PVDF film has good weather resistance, high barrier properties, low water permeability, can withstand low temperatures, has excellent mechanical properties in a severe cold environment of -40°C, and does not crack; the process design of this application is reasonable, the component ratio is appropriate, and the prepared PVDF film has excellent weather resistance and UV resistance, and the product has excellent mechanical properties and good barrier effect. It can be widely used in the photovoltaic field and has high practicality.

Description

technical field [0001] The invention relates to the technical field of PVDF films, in particular to a low-temperature-resistant PVDF film for photovoltaic backplanes and a preparation method thereof. Background technique [0002] With the progress of society and the improvement of human awareness of the environment, the development of new energy has become the focus of global attention. The global new energy industry is developing rapidly, and photovoltaic power generation projects are particularly prominent. The photovoltaic power generation projects in ordinary environmental areas are increasingly saturated. At present, the construction of photovoltaic power generation projects It is being carried out to the severe cold regions of the world. However, the PVDF films currently on the market for photovoltaic backplanes are generally not resistant to low temperatures. Generally, under zero degrees or in environments with large temperature differences between day and night, the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/18C08L27/16C08L33/12C08L51/00C08K9/10C08K3/22
CPCC08J5/18C08J2327/16C08J2433/12C08J2451/00C08K9/10C08K2003/2275C08K2201/01C08K5/28C08K3/22C08K2003/2241C08K9/06
Inventor 郑泓聂福
Owner 嘉兴高正新材料科技股份有限公司