Different-band pumping 1550nm photon cascade VCSEL (vertical cavity surface emitting laser) and preparation method thereof
A technology of lasers and photons, which is applied in the direction of lasers, phonon exciters, laser components, etc., can solve the problems of low luminous intensity and luminous efficiency, achieve low luminous intensity and luminous efficiency, efficient use, and improve luminous efficiency Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0032] The invention provides a 1550nm out-of-band pumped photon cascaded VCSEL laser and its preparation method, which can realize efficient utilization of energy in the process of energy level transition, improve luminous efficiency, and realize laser output with a wavelength of 1550nm. The design basis is as follows:
[0033] Rare earth ions have the advantages of stable luminescence properties, long fluorescence lifetime, large anti-Stokes shift and sharp luminescence peaks, and are used in many laser materials, rare magnetic semiconductor materials, nonlinear optical materials and nano-luminescent materials. The active ions of the active ions, which are doped into the material as impurities, have an extremely important impact on the microstructure, electrical properties, and optical magnetic properties of the material; the rare earth element-doped working substance has the characteristics of high doping concentration and high quantum conversion efficiency. It can greatly r...
specific Embodiment 1
[0047] Such as figure 2 As shown, the present invention provides a method for preparing a bottom emission out-of-band pumped 1550nm photon cascade VCSEL laser, comprising:
[0048] Step 1. Growth of epitaxial structure
[0049] N-type semi-reflective DBR layer, N-type total reflection DBR layer, N-type waveguide layer, semiconductor quantum well layer, P-type waveguide layer, oxide layer, P-type total reflection DBR layer, P-type fully reflection DBR layer;
[0050] Step 2. Rare earth doping
[0051] After the epitaxial wafer is cleaned, it is blown dry with high-purity nitrogen protection, heated and dried, and 500nm SiO is deposited by PECVD technology. 2 As an implantation mask, spin-coat thick glue in the non-implantation area, then put the epitaxial wafer into the ion implanter for implantation, and implant multi-layers of erbium, erbium ytterbium, erbium ytterbium scandium, and Other lanthanide metal ions, forming GaAs, ErxAsz, YbyAsz (wherein x+y+z=1) or XyAsz (X i...
specific Embodiment 2
[0068] Such as image 3 Shown, the present invention provides a kind of preparation method of the photon cascade VCSEL laser of bottom emission 1550nm, comprising:
[0069] Step 1. Growth of epitaxial structure
[0070] Epitaxial growth of N-type semi-reflective DBR layer and N-type total reflection DBR layer on the surface of GaAs substrate in sequence;
[0071] Step 2. Epitaxial growth of rare earth ion doped layer
[0072] Using MBE technology to continue to grow multi-layer erbium, erbium ytterbium, erbium ytterbium scandium, and other lanthanide metal ions on the N-type total reflection DBR layer to form GaAs, ErxAsz, YbyAsz (wherein x+y+z=1) or XyAsz ( X is a rare earth ion-doped layer of a multilayer structure in which layers of lanthanide elements are alternately grown. Using MBE technology to continue to grow N-type waveguide layer, semiconductor quantum well layer, P-type waveguide layer, oxide layer, P-type total reflection DBR layer, P-type total reflection DBR ...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


