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PERC solar single crystal cell alkali polishing front protection process

A solar energy and single crystal technology, applied in the direction of circuits, electrical components, semiconductor devices, etc., can solve the problems of affecting the electrical performance of the battery, insufficient protection effect, corrosion of phospho-silicate glass, etc., to achieve lower technical threshold, good protection effect, and larger The effect of corrosion

Pending Publication Date: 2022-06-24
江苏捷捷半导体新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, in the alkali throwing tank, the alkali (KOH or NaOH) corrodes the back of the single crystal silicon wafer, which will also cause corrosion to the front phosphosilicate glass, and then damage the PN junction, affecting the electrical performance of the battery
[0003] For this reason, it is necessary to strengthen the protection of the front phosphosilicate glass in the alkali throwing tank, reduce the corrosion of the alkali on the phosphosilicate glass, improve the selective corrosion of the front and back of the single crystal silicon wafer in the alkali throwing tank, and increase the corrosion rate of the back side. At the same time, it reduces the corrosion of the front phosphosilicate glass. Although the alkali throwing tank uses alkali throwing additives to protect the front phosphosilicate glass, the protection effect is still not enough. Therefore, it is necessary to develop a front side for alkali polishing of PERC solar single crystal cells. protection process

Method used

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  • PERC solar single crystal cell alkali polishing front protection process
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Experimental program
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Effect test

Embodiment 1

[0036] The present embodiment provides a process for protecting the front surface of a PERC solar monocrystalline cell by alkali polishing, which includes the following steps:

[0037] S1. Pre-cleaning: Use mixed solution A to clean single crystal silicon wafers at 45°C for 60s. The volume ratio of hydrogen peroxide, potassium hydroxide and pure water in mixed solution A is 14:1.5:320;

[0038] S2. Surface modification: Add 100 g of dimethyldichlorosilane to 900 g of trichloroethylene in the surface modification tank to obtain a surface modification solution, and immerse the pre-cleaned single crystal silicon wafer into the surface modification solution. The modification time was 300s, and the modification temperature was 25°C.

[0039] S3. Alkali polishing: the single crystal silicon wafer after surface modification in step S2 is subjected to alkali polishing for 210s at 65°C with mixed solution B. The volume ratio of potassium hydroxide, additives and pure water in mixed sol...

Embodiment 2

[0044] The present embodiment provides a process for protecting the front surface of a PERC solar monocrystalline cell by alkali polishing, which includes the following steps:

[0045] S1. Pre-cleaning: Use mixed solution A to clean single crystal silicon wafers at 55°C for 75s. The volume ratio of hydrogen peroxide, potassium hydroxide and pure water in mixed solution A is 14:1.5:320;

[0046] S2. Surface modification: 150g of dimethyldichlorosilane was added to 850g of trichloroethylene in the surface modification tank to obtain a surface modification solution, and the single crystal silicon wafer after pre-cleaning was immersed in the surface modification solution. The modification time was 300s, and the modification temperature was 25°C.

[0047] S3. Alkali polishing: the single crystal silicon wafer after surface modification in step S2 is subjected to alkali polishing for 230s at 80°C with mixed solution B. The volume ratio of potassium hydroxide, additives and pure wate...

Embodiment 3

[0052] The present embodiment provides a process for protecting the front surface of a PERC solar cell by alkali polishing, which includes the following steps:

[0053] S1. Pre-cleaning: Use mixed solution A to clean single crystal silicon wafers at 30°C for 50s. The volume ratio of hydrogen peroxide, potassium hydroxide and pure water in mixed solution A is 14:1.5:320;

[0054] S2. Surface modification: Add 100g of hexamethyldisilazane to 900g of dimethylformamide in the surface modification tank to obtain a surface modification solution, and immerse the pre-cleaned single crystal silicon wafer into the surface modification In liquid, the modification time is 300s, and the modification temperature is 25℃.

[0055] S3. Alkali polishing: the single crystal silicon wafer after surface modification in step S2 is subjected to alkali polishing for 195s at 60°C with mixed solution B. The volume ratio of potassium hydroxide, additives and pure water in mixed solution B is 16:4: 320;...

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Abstract

The invention provides a PERC solar single crystal cell alkali polishing front surface protection technology. The technology comprises the following steps: S1, pre-cleaning: cleaning a single crystal silicon wafer; s2, surface modification: preparing a surface modifier in a surface modification tank, and immersing the cleaned monocrystalline silicon wafer into the surface modifier for surface modification; s3, alkali polishing: carrying out alkali polishing on the monocrystalline silicon wafer after surface modification; s4, post-cleaning: cleaning the monocrystalline silicon wafer after alkali polishing; s5, acid pickling: performing acid pickling on the monocrystalline silicon wafer; and S6, drying: drying the pickled monocrystalline silicon wafer. The preparation method comprises the following steps: firstly, carrying out surface modification on front phosphorosilicate glass by utilizing a surface modifier, enabling an alkylating reagent used by the surface modifier not to influence a back silicon surface structure, hydrolyzing the alkylating reagent on the surface of the phosphorosilicate glass, replacing surface silicon hydroxyl and forming dense strong hydrophobic groups, and converting the hydrophilicity of the surface of the phosphorosilicate glass into strong hydrophobicity; therefore, the corrosion rate of alkali to phosphorosilicate glass can be greatly reduced in the alkali polishing tank.

Description

Technical field [0001] The invention belongs to the field of PERC solar monocrystalline battery processing, and specifically relates to a PERC solar monocrystalline battery alkali polishing front protection process. Background technique [0002] At present, in the production process of PERC solar monocrystalline cells, the alkali polishing stage process (see figure 1 ) includes pre-cleaning (hydrogen peroxide + potassium hydroxide + water) + alkali polishing (potassium hydroxide + additive + water) + post-cleaning (hydrogen peroxide + potassium hydroxide + water) + pickling (HF + HCL + water) + drying. Among them, in the alkali polishing tank, alkali (KOH or NaOH) corrodes the back of the single crystal silicon wafer, which also corrodes the phosphosilicate glass on the front, thereby damaging the PN junction and affecting the electrical performance of the battery. [0003] For this reason, it is necessary to strengthen the protection of the front phosphosilicate glass in t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L21/306
CPCH01L31/1804H01L31/186H01L21/30604
Inventor 王波郭熹刘治洲单璐璐
Owner 江苏捷捷半导体新材料有限公司