Nitride hard film applied to surface of hot forging die and preparation method of nitride hard film
A hot forging die and film preparation technology, which is applied in metal material coating process, vacuum evaporation coating, coating, etc., can solve the problems affecting the surface finish of forgings and die life, the quality stability of forgings, and the increase of production costs. , to achieve the effect of shortening the number of maintenance and maintenance cycle, increasing the service life and improving the processing efficiency
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[0030] The preparation method of the thin film material provided by the present invention mainly comprises the following steps:
[0031] 1) Using hot forging die steel or high-speed steel as the base, grinding, polishing, cleaning and drying the steel base and fixing it on the rotatable workpiece frame in the vacuum chamber;
[0032] 2) Install a certain number of ZrCr targets and Cr targets on the target position inside the multi-arc ion plating equipment;
[0033] 3) Then pump the vacuum in the vacuum chamber to ≤5×10 -3 Pa, turn on the workpiece turret rotation system to make the workpiece rack rotate, the flow rate of argon gas is 200-600sccm, the working pressure is 1.0-2.0Pa, the workpiece is biased at -300--900V, and a glow discharge is generated in the vacuum chamber, which is harmful to the heat. Glow cleaning on the surface of the forging die;
[0034] 5) The flow rate of argon gas introduced into the medium is 40-200sccm, the working pressure of the arc evaporatio...
Embodiment 1
[0038] 1) Four ZrCr targets (Zr:Cr=80:20) and four Cr targets are used as deposition sources, wherein the purity of both ZrCr targets and Cr targets is 99.95%;
[0039] 2) H13 steel, a commonly used steel for hot forging dies, is used as the base. After grinding, polishing, cleaning, drying and sandblasting, the H13 steel base is fixed on a rotatable workpiece frame in a vacuum chamber. The workpiece frame rotates at 3 rpm and rotates. The way is uniaxial rotation.
[0040] 3) The vacuum degree in the vacuum chamber should be pumped to ≤5×10 -3 After Pa, 600sccm of argon gas was introduced, when the vacuum chamber pressure was 1.9Pa, the surface of the substrate was cleaned by glow for 30min, and the bias voltage of the workpiece holder was -900V.
[0041]4) Pour 40sccm of argon gas, when the vacuum chamber pressure is 0.2Pa, set the workpiece frame bias to -200V, the target current of 4 Cr targets is 50A, and the arc evaporates 4 Cr targets for 10min; Pour in 40sccm of argon...
Embodiment 2
[0045] 1) 4 pieces of ZrCr targets (Zr:Cr=50:50) and 4 pieces of Cr targets are used as deposition sources, wherein the purity of the ZrCr targets and the Cr targets are both 99.95%;
[0046] 2) M2 steel high-speed steel is selected as the substrate, and the steel substrate is ground, polished, cleaned, dried and sandblasted, and then fixed on the rotatable workpiece rack in the vacuum chamber. The workpiece rack rotates at 3 rpm and the rotation mode is uniaxial rotation. .
[0047] 3) The vacuum degree in the vacuum chamber should be pumped to ≤5×10 -3 After Pa, 500sccm of argon gas was introduced. When the pressure of the vacuum chamber was 1.8Pa, the surface of the substrate was cleaned by glow for 30min, and the bias voltage of the workpiece holder was -300V.
[0048] 4) Pour 40sccm of argon gas, when the vacuum chamber pressure is 0.2Pa, set the workpiece frame bias to -200V, the target current of 4 Cr targets is 60A, and the arc evaporates 4 Cr targets for 10min; Pour ...
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