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Method for preparing integrated Prague plane waveguide grating by primary ion exchange process

A technology of ion exchange and waveguide grating, which is applied in the field of optical devices and integrated optics, can solve the problems of complicated instrument adjustment process, large-scale application limitation, and lack of flexibility of holographic interference exposure method.

Inactive Publication Date: 2007-01-17
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Not only that, the holographic interference exposure method lacks flexibility (for example, it is not easy to prepare curved grating structures), and the instrument adjustment process is complicated
Therefore, the large-scale application of these methods in the fabrication of planar integrated Bragg waveguide gratings is limited

Method used

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  • Method for preparing integrated Prague plane waveguide grating by primary ion exchange process
  • Method for preparing integrated Prague plane waveguide grating by primary ion exchange process
  • Method for preparing integrated Prague plane waveguide grating by primary ion exchange process

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Embodiment 1

[0023] The implementation of this program can be implemented through the following steps:

[0024] (A) Design a reasonable grating structure, and determine important parameters such as grating constant, grating length, and grating refractive index variation range;

[0025] (B) Design and make a mask plate according to the grating parameters, and determine the selected glass substrate and ion exchange process parameters;

[0026] (C) Use usual microfabrication means (photolithography, corrosion, etc.) to process periodic strip masks on the glass surface, form ion exchange windows between adjacent strip masks, and form mask patterns. The photolithography process can be ultraviolet light exposure (including contact and non-contact), electron beam exposure and holographic exposure, or one of the nanoimprinting methods;

[0027] (D) Put the glass substrate with a periodic strip mask on the surface into a molten salt containing dopant ions with high polarizability, keep it at a cer...

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Abstract

The invention relates to a method for preparing integrated Prague plane waveguide grating by primary ion exchange process, wherein super fine processing technology is employed to produce periodic bar shape diffusion windows on the glass substrate surface, then the glass sheet is charged into molten salt containing high polarizability doped ions for ion exchange, during witch the bar shape optical waveguide crossing caused by adjacent ion exchange window diffusion can form surface plate optical waveguides with periodic wrinkles, which can realize modulation to the incident light, and add-drop multiplexer or electric filter in the integrated optical circuit can be prepared by utilizing the grating diffraction principle.

Description

technical field [0001] The invention relates to a method for manufacturing a plane integrated Bragg (Bragg) waveguide grating on a glass substrate by using a primary ion exchange process, belonging to the fields of optical devices and integrated optics. Background technique [0002] Planar integrated Bragg waveguide grating is a commonly used integrated optical component. It can realize multiplexing / demultiplexing or filtering of different wavelength optical signals in the integrated optical circuit. Based on the above functions of this grating, it can be made into an optical communication network. Widely used multiplexer / demultiplexer, optical add-drop multiplexer (OADM) and optical filter. [0003] At present, the commonly used fabrication methods of this kind of grating include holographic interference exposure method and electron beam (or laser) direct writing method. The implementation of these two methods requires high-precision equipment, and the obtained refractive ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/124G02B6/13G02B5/18G03F7/20
Inventor 郝寅雷吴亚明赵本刚
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI