Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Prepn of self-assembled superthin polymer film

A polymer film, self-assembly technology, applied in nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve problems such as low strength, achieve low surface energy, good solvent resistance, reduce The effect of capillary condensation

Inactive Publication Date: 2003-03-19
LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
View PDF2 Cites 28 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Patent literature search proves that the anti-friction and anti-wear of MEMS is usually completed by the perfluoropolyether layer, such as foreign patents IT19871007, IT1052502, US1231051, JP99106209, etc. The perfluoropolyether layer and the substrate are mainly bonded by hydrogen bonds, and the strength is low , the life expectancy needs to be further improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Example 1: Preparation of self-assembled styrene film on monocrystalline silicon substrate:

[0019] 1. Styrene 5.2g, vinyltrimethoxysilane 0.095g, azobisisobutyronitrile 0.082g, dissolve

[0020] In anhydrous toluene solution, with a total volume of 50ml, vacuumize under magnetic stirring - pass nitrogen three times, 80

[0021] °C for 6 hours, the polymer conversion rate was 98%.

[0022] 2. Pre-treat the single crystal silicon substrate, the single crystal silicon wafer polished on one side is firstly ultrasonicated in acetone solvent

[0023] Wash for 5 minutes, blow dry with high-purity nitrogen, and put in newly prepared concentrated H with a volume ratio of 70:30. 2 SO 4

[0024] and 30%H 2 o 2 In the solution, keep at 90°C for 0.5 hours to react. After taking out the single crystal silicon wafer, use 50ml

[0025] Distilled water twice, washed ultrasonically three times, and dried with high-purity nitrogen to obtain hydroxylated silicon wafers....

Embodiment 2

[0034] Embodiment 2: the preparation of polymethacrylate fluorine-containing alkyl ester film:

[0035] Heptadecafluorodecyl methyl methacrylate 0.532g, methyl methacrylate 0.09g methacryloxypropyltrimethoxysilane 0.0248g, azobisisobutyronitrile 0.0164g, dissolved in anhydrous toluene solution , with a total volume of 50ml, under magnetic stirring, evacuate-nitrogen three times, and react at 80°C for 6 hours. A self-assembled polymer was obtained with a conversion rate of 76%. The hydroxylated silicon substrate was immersed in a copolymer / toluene solution with a concentration of 2mg / ml, reacted at 70°C for 24 hours, and heat-treated at 120°C for 10 hours to obtain a highly hydrophobic polymer film with a thickness of 5.2nm.

Embodiment 3

[0036] Embodiment 3: the preparation of polysilicone methacrylate film:

[0037] 1.56g of single-ended methacryloxy polydimethylsiloxane with a molecular weight of 780, 0.0496g of methacryloxypropyltrimethoxysilane, and 0.00164g of azobisisobutyronitrile, mixed with anhydrous toluene, The total volume is 50ml, vacuum-gas three times, and react at 80°C for 6 hours to obtain a silicone oil-containing self-assembled polymer. The hydroxylated silicon substrate was immediately immersed in a polydimethylsiloxane side chain-containing copolymer / toluene solution at a concentration of 5 mg / ml to form a film. The silicon oil film prepared by the method has a thickness of 3.4nm, has strong hydrophobicity, and has a static water contact angle exceeding 110°, and can be used as an anti-adhesion protective layer and a lubricating layer of a micro-electromechanical system.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Film thicknessaaaaaaaaaa
Average roughnessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention is the preparation process of one kind of superthin polymer film. Filming material is first synthesized via free radical copolymerization and superthin polymer film with different surface property is then prepared by means of self-assembling technological process. The process is simple and the prepared superthin polymer film has friction reducing and wear resisting effect and may be used in the lubrication and protection of mini electromechanical system.

Description

technical field [0001] The invention relates to a preparation method of a self-assembled ultra-thin polymer film. Background technique [0002] With the advancement of high technology, the machinery manufacturing industry is developing towards miniaturization. The resulting micro-electromechanical devices such as micro-motors, micro-accelerators, micro-drivers, micro-gears, micro-valves, micro-magnetic heads, and nuclear weapon encryption devices will play an important role in daily life and national defense. [0003] Due to the small size and high surface area / volume ratio of MEMS devices, surface forces such as friction, capillary force, and electrostatic force become the main factors affecting their performance. Therefore, it is very urgent to improve the interaction between the moving surfaces of micromachines. [0004] Patent literature search proves that the anti-friction and anti-wear of MEMS is usually completed by the perfluoropolyether layer, such as foreign pate...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C08J5/18C08L25/04C08L33/04C08L83/04
CPCB82Y30/00
Inventor 刘维民周峰刘建喜陈淼
Owner LANZHOU INST OF CHEM PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com